Journal of The Surface Finishing Society of Japan
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
Volume 64, Issue 7
Displaying 1-7 of 7 articles from this issue
Special Feature / Current Trends in Sputtering
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  • Yo-ichiro SUZUKI, Yukio H. OGATA
    2013Volume 64Issue 7 Pages 407-415
    Published: July 01, 2013
    Released on J-STAGE: July 01, 2014
    JOURNAL FREE ACCESS
    Pd-Sn catalysts possess excellent catalyst performance for electroless metal deposition. They have attracted interest for converting non-conductive surfaces into conductive ones. The present investigation was undertaken to verify the decomposition behavior of a Pd-Sn catalyst solution from the viewpoint of the colloid and solution chemistries.
    HCl gas is volatilized during spontaneous decomposition of Pd-Sn catalysts, which suggests that the stability of Pd-Sn catalysts is related to stannous ion complexation, depending on the chloride ion concentration. The core of the Pd-Sn catalyst is protected with(SnCl3 molecules, which have a lone pair of electrons, to prevent the primary particles in the Cl concentration range of about 3 M or more from aggregating. The solution chemistry of stannous chloro-complexes shows that, in such a higher concentration of Cl, a small number of (SnCl2)molecules with unoccupied p-orbitals exists in the Pd-Sn solution. Such molecules act as a cross-linking agent. They enhance the probability of the aggregation of primary particles.
    In general, it is believed from the results of aerated accelerating-tests that Sn2+ ions are oxidized to Sn4+ ions by dissolved oxygen molecules, and that the decrease in Sn2+ concentration causes aggregation(or decomposition). This work confirmed that Cl concentrations influ ence the decomposition of Pd-Sn catalysts. We conclude that the spontaneous decomposition mechanism of Pd-Sn catalysts differs from the decomposition mechanism of Pd-Sn catalysts performed by the accelerating-tests.
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