In this study, TiO
2 films were prepared on Ag-Pd alloys by Plasma-enhanced Chemical Vapor Deposition (PECVD) using Ti(O-
i-Pr)
2(dpm)
2 precursor. Ag-Pd alloys are widely used as a substrate material of a resin-veneered dental crown. Since an adhesion of a dental resin to the Ag-Pd alloy substrate is poor, protuberances are usually formed on the substrate surface to sustain the mechanical retention. One of the weak points in the resin-veneered dental crown is that a mechanical retention should be indispensable to fix the resin onto the metal frame. Instead of mechanical retention, TiO
2 films were prepared on the substrates.
The effects of the deposition conditions on the crystalline phases, microstructures, and color of the deposited films were investigated. As a result, at a substrate pre-heating temperature T
dep=500°C, microwave power P
M=2 kW, deposition pressure P
tot=0.4 or 0.7 kPa, the film color changed from black to white, and crystalline phase was anatase. And the microstructure of the film was granular. The grain size was a diameter of about 100 nm. These are optimum deposition conditions.
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