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Volume 34 (1986)
- Issue 6 Pages 339-
- Issue 5 Pages 257-
- Issue 4 Pages 197-
- Issue 3 Pages 139-
- Issue 2 Pages 71-
- Issue 1 Pages 13-
Volume 34, Issue 6
Displaying 1-6 of 6 articles from this issue
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SPECIAL CONTRIBUTIONS
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Formation of Negative Cluster Ions by Collisional Electron Transfer from High-Rydberg Rare Gas AtomsTamotsu Kondow, Kozo Kuchitsu1986 Volume 34 Issue 6 Pages 339-349
Published: 1986
Released on J-STAGE: May 01, 2007
JOURNAL FREE ACCESSNegative-ion mass spectroscopy has been applied to a study of electron attachment to van der Waals clusters. A new ion source, which utilizes impact of high-Rydberg rare gas atoms as a source of electrons with kinetic energies as low as -10 meV, has been constructed. The design and the operation of this source as well as a detector of massanalyzed ions by way of negative-to-positive charge conversion are described. As test experiments, the intensities of the various negative cluster ions produced from the neutral clusters of CCl4 and CH3CN have been studied, and the characteristic features of the present technique for formation of negative cluster ions are discussed.View full abstractDownload PDF (706K) -
Charge Transfer Cross Sections of Ar3+ and Kr3+ in their own GasesKazuhiko Okuno, Yozaburo Kaneko1986 Volume 34 Issue 6 Pages 351-365
Published: 1986
Released on J-STAGE: May 01, 2007
JOURNAL FREE ACCESSThe trajectories of charged particles moving in an octopole ion beam guide (OPIG) are computer-simulated for various initial conditions of motion. Boundary conditions between the stable and unstable regions of beam trajectory in OPIG are obtained. These calculated results are very useful for operation of OPIG under the best condition.
In low energy collision experiments using the beam guide technique, cross sections of one -, two- and three-electron capture processes in collision systems of Ar3+-Ar and Kr3+-Kr are measured in energy region from 0.375 to 768 eV in center-of-mass system. In both collision systems, one-electron capture reaction is predominant in higher energy side, however, the dominant reaction changes from one-electron capture reaction to the symmetric resonant three-electron capture reaction in the low energy region below about 10 eV. As was predicted, it was first confirmed that each cross section obtained for symmetric resonant triple-charge -transfer reaction of Ar3+ and Kr3+ at the low energy end of Ecm = 0.375 eV is larger than both cross sections of symmetric resonant double-charge-transfer for the doubly charged ion and symmetric resonant single-charge-transfer for the singly charged ion.View full abstractDownload PDF (1162K) -
Hokotomo Inouye1986 Volume 34 Issue 6 Pages 367-379
Published: 1986
Released on J-STAGE: May 01, 2007
JOURNAL FREE ACCESSA series of investigation on repulsive potentials between ions and atoms, done by us, is summarized.
Repulsive potentials in an exponential formula determined with a beam scattering method are listed for pairs of closed-shell ions and rare gas atoms and for those of a few kinds of open -shell ions and He atoms.
Some description is given about repulsive potentials between alkali ions and open-shell atoms and between open-shell ions and rare gas atoms, which were obtained by statistical calculation and were in excellent agreement with the experiments.View full abstractDownload PDF (888K) -
Making Instrument as an Important Step of Chemical StudiesJunjiro Kai1986 Volume 34 Issue 6 Pages 381-396
Published: 1986
Released on J-STAGE: May 01, 2007
JOURNAL FREE ACCESSA double focusing mass spectrograph has been developed and used for various chemical studies since 1958 at Kyoto University. The instrument is of the Mattauch-Herzog type provided with a high frequency spark ion source. Design factors, installation, and testing of the machine are reviewed. Some features of the machine are discussed and given.View full abstractDownload PDF (1286K) -
Fumiya Konishi, Kenzi Kusao, Yoshiaki Yoshioka1986 Volume 34 Issue 6 Pages 397-408
Published: 1986
Released on J-STAGE: May 01, 2007
JOURNAL FREE ACCESSMass spectometric techniques for the analysis of trace components in solids have been developed since it has been needed for the microfablication of semiconductor devices. SSMS (Spark Source Mass Spectrometry) has been first applied for the bulk analysis of Si and Ge, and contributed to the development of transistors through the analysis of materials. As semiconductor devices have been microminiaturized into IC, SIMS (Secondary Ion Mass Spectrometry) has been developed and image analysis of SIMS (Scanning type or Ion Microscopic type) has been also advanced.
LIMS (Laser Ionization Mass Spectrometry) and Micro beam SIMS have been developed for the loacal analysis. GDMS (Glow Discharge Mass Spectrometry) has also been developed. The ion emission from GDMS ion source is more stable than that from spark ion source.
Sasaki and his group have done pioneering works on ion microscope. This paper describes them and reviews of mass spectrometric techniques in solids.View full abstractDownload PDF (932K) -
Shigeo Hayakawa, Naoki Nose, Tsutomu Makita1986 Volume 34 Issue 6 Pages 409-421
Published: 1986
Released on J-STAGE: May 01, 2007
JOURNAL FREE ACCESSIt is well recognized that the charge exchange reaction in the atomic and molecular collision plays an important role in many physical phenomena including chemical reactions. Since the early stage of mass spectroscopy, the charge transfer signals have been reported often. A new time-of-flight analyzer is developed for the determination of the mass, the kinetic energy, and the very small scattering angle difference of the product neutral particles in charge exchange collision processes. The analyzer is essentially the Mattauch-Herzog type double focusing mass spectrograph combined with a straight path tube for the fast neutrals. Experimental results of doubly differential cross sections for Ar+-Ar collision system revealed the new TOF analyzer is promising. The effects of the sweeping field on the ion packet length, the energy spread, and the direction divergency were studied, and the triple focusing conditions were obtained for a new high resolution TOF analyzer with a sector type toroidal electric field. The focusing TOF analyzer was installed, and the time resolution of the analyzer is expected to be 36,000.View full abstractDownload PDF (876K)
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