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Volume 46 (1983)
- Issue 6 Pages 463-
- Issue 5 Pages 381-
- Issue 4 Pages 251-
- Issue 3 Pages 155-
- Issue 2 Pages 87-
- Issue 1 Pages 1-
Volume 46, Issue 2
Displaying 1-6 of 6 articles from this issue
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1983 Volume 46 Issue 2 Pages 87
Published: April 28, 1983
Released on J-STAGE: August 11, 2011
JOURNAL FREE ACCESSDownload PDF (2965K) -
Kazumi NAKATSU, Hiroshi YOSHIOKA, Satoshi NISHIGAKI1983 Volume 46 Issue 2 Pages 89-98
Published: April 28, 1983
Released on J-STAGE: August 11, 2011
JOURNAL FREE ACCESSIn order to obtain reliable structural models of molecular arrangements in low-dimensional dye aggregates, crystal structures of nineteen cyanines, four merocyanines, eight styryls, and six TCNQ salts of cyanines have been investigated by X-ray crystallography. In most of the crystals the dye molecules stack face-to-face to form columns or one-dimensional arrays; they were classified into five distinctive types according mainly to the disposition of inversion center that relates the adjacent dye molecules; this confines the magnitudes of the columnar and the nearest-neighbor slip-angles. The columns assemble together to form layer-like or two-dimensional arrangements which resemble those so far proposed. All the four patterns, herring-bone, brickwork, staircase, and ladder, found in the crystal structures, were displayed and discussed. An attempt to correlate the molecular shape with the aggregation type is given.View full abstractDownload PDF (1079K) -
Spectral Sensitization of Photopolymers Containing Azido GroupKenichi KOSEKI, Hitoshi ECHIGO, Tsuguo YAMAOKA, Takahiro TSUNODA1983 Volume 46 Issue 2 Pages 99-105
Published: April 28, 1983
Released on J-STAGE: August 11, 2011
JOURNAL FREE ACCESSSpectral sensitization of photopolymer with several sensitizers was studied for the argon laser lithography in which 488 nm and 514.5 nm lines were mainly used for exposure. By addition of spectral sensitizers, the range of spectral sensitivity was extended toward longer wavelength. Argon ion laser beem was irradiated in the form of spot on the photosensitive layer coated on silicon wafer or aluminum base. The spot size of the laser beem used was 1.25 mm diameter. The characteristic curve was obtained to plot the spot diameter of cured polymer on the plate against the exposed energy. Among the photopolymer systems studied, the combination of poly [vinyl p-azidobenzoate] and 4-(4'-butoxyphenyl)-2, 6-diphenylthiopyrylium perchlorate showed a very high sensitivity, 1.8 mJ/cm2 for the 488 nm laser line. This photopolymer systems followed to the reciprocity law in the light intensity range of 6μJ/cm2 sec-80 J/cm2 sec. In spot exposure of laser beem, it seemed resonable to evaluate the sensitivity value from the exposure energy to cure the photopolymer to the same size as 1.25 mm.View full abstractDownload PDF (2871K) -
Kenkichiro KOBAYASHI, Masasuke TAKATA, Shoichi OKAMOTO, Yoshihiro AIKA ...1983 Volume 46 Issue 2 Pages 106-110
Published: April 28, 1983
Released on J-STAGE: August 11, 2011
JOURNAL FREE ACCESSThe formulas for rearrangement energy of solvent were derived by using dielectric continuum approximation. The conventional formula for the rearrangement energy of solvent was corrected for the absence of solvent inside ions. The effect of supporting electrolyte on the rearrangement energy of solvent was discussed. The discrepancy between the calculated rearrangement energy of aquocomplex and experimental one was interpreted in terms of breakdown of adiabatic electron transfer.View full abstractDownload PDF (616K) -
Shin OHNO1983 Volume 46 Issue 2 Pages 111-124
Published: April 28, 1983
Released on J-STAGE: August 11, 2011
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Film to Tape, Tape to FilmIsao KATO1983 Volume 46 Issue 2 Pages 125-131
Published: April 28, 1983
Released on J-STAGE: August 11, 2011
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