The nanoscale phenomena, such as chemical mechanical polishing (CMP) process, present near the surface. A three-dimensional nanoparticle tracking could explain the phenomena that happen in the polishing process. From our previous report, we have investigated the three-dimensional motion of an individual standard nanoparticle by using optical method, but the height Z on the third dimension was not accurately verified. In this report, the sub-100 nm individual nanoparticles were fixed on the tip which the tip was connected to the piezo actuator for controlling the height Z displacement. The multi-wavelength evanescent fields with optical microscopy system is also applied in the experiment for three-dimensional nanoparticle tracking. The scattering light from nanoparticle will exponentially increase when the nanoparticle on the tip was downward moved close to the reference surface. Finally, The height Z uncertainty could be measured approximately ±25 nm and the penetration height measurability were 200 nm far from the reference surface. We could three-dimensionally track the individual standard nanoparticle in recording speed higher than 50 frames per second for exposure time less than 10 milliseconds.

In recent years, cutting in the medical and industrial fields has been performed using a blade with a small radius of curvature of less than 1μm at the tip of the cutting edge. At present, non-destructive methods for measuring and evaluating shapes have not been established. Therefore, the purpose of this study was to develop a non-destructive three-dimensional shape measuring device for a blade with a complicated shape at the tip of the blade. In this report, we proposed a method for calculating the radius of curvature, developed a device capable of three-dimensional measurement, and confirmed the calculation method and the effectiveness of the device by evaluation experiments.

This paper reports development of an optical apparatus for Real-time observation during chemical reactions in Nano-scale process on surface such as CMP (Chemical-Mechanical polishing) and catalysis by applying in evanescent field. Beside using evanescent field to observe Nano-particles in physical aspects, the developed Raman spectroscopy apparatus aims to observe chemical aspects during reactions on processing surface. Changes in Raman scattering spectrum is expected to understand chemical reactions on the processing surface. In this report, the 532 nm wavelength laser source will be used to generate evanescent field. A rotation stage of diffraction grating and a translation stage will used to optimize the Raman spectrum data.

We aim to develop an alignment monitor which consists of multiple measurement paths of absolute distance interferometers which refer a pulse interval of an optical frequency comb compressed by an etalon as a length reference. Our previous studies suggested that the compressed pulse interval is determined by a free spectral range of the etalon and we had calibrated the pulse interval by referring a gauge block with uncertainty of 6 ppm (k = 2). Here, we calibrate it by using a reference interferometer calibrated with uncertainty of 1.7 ppm (k = 2) aiming for smaller uncertainty.

Inner cercumference measurement of small complex parts,such as barrels for small-lenses dedicated for smartphones, has been in a great demand lately. To meet this demand,a new inner contour measuring method was developed. This new method tilts the optical axis of the point autofocus probe (PAP) to measure inner contour by applying the high tracking ability of PAP. The new measuring method has effective measuring inclination angles and measures cross section and circumference contours of a workpiece having its inner diameter less than several millimeters in sub-micron accuracy without repositioning by setting the optimal measuring conditions. In this paper,measurement accuracy and repeatability of inner contour measurement were verified by using an objective lens that is capable of measuring diameter having less than 7mm with its depth up to 7mm. It is useful for inner contour measurement of small lens ballels.

Modern industrial materials have excellent properties. However, generally these materials are difficult-to-cut materials. In this Study, investigates the effect of the characteristics cutting conditions of various materials using TiAlN coated carbide radius end mill to tool wear and surface roughness. That is Titanium(Ti) and Titanium Alloy(Ti6Al4V) under high-speed milling condition. The cutting conditions are as follows, end mill diameter: 6 mm, corner radius: 0.5 mm, 4 blades, and depth of cut: 0.2 mm, pick feed: 0.1 mm, feed rate: 0.1, 0.15 mm/tooth, cutting speed 100-400 m/min and investigate 50-500 m of cutting length. The experimental tests were carried out in the dry cutting condition. In surface roughness, optimized cutting condition of titanium were at cutting speed 200 m/min, feed rate 0.15 mm/tooth and Ti6Al4V were at cutting speed 400 m/min, feed rate 0.1 mm/tooth. And in tool wear. Titanium wear is minimized at a 200 m/min cutting speed, feed rate 0.15 mm/tooth and Ti6Al4V is 100 m/min, feed rate 0.15 mm/tooth.

The nanoscale polishing phenomena between the substrate surface and polishing pad during process, such as CMP process, were observed and evaluated, in this report. The concept of observation method is applied the generated evanescent field to limit the observable region only on the surface being polished, and the detectable scattering light from the nanoparticles and polishing pad when they move close to the surface in a range of evanescent field. The detected scattering light intensity could be used for evaluating the phenomena. According to the observed results, there should have been more than two different phenomena in polishing; the particles adhering on the polishing pad, and the individual movement particles during moving. However, the phenomena being able to perform polishing, could not clearly identify yet.