The effect of polymer matrix on photocuring was investigated in connection with the molecular motion of polymer-chain segments in poly (alkyl methacrylate) -aromatic bisazide systems. On UV irradiation to the film of poly (
n-butyl methacrylate) (P
nBMA) system, the polymer became insoluble in tetrahydrofuran by the photodecomposition of azide groups. The gel fraction of PnBMA matrix which showed low glass transition temperature (
Tg) was higher than that of poly (isobutyl methacrylate) (PiBMA) matrix which had high reactive side-chains for nitrenes at 30°C. On raising the irradiation temperature, the gel formation was observed in order of P
nBMA, PiBMA, poly (ethyl methacrylate), poly (isopropyl methacrylate), poly (methyl methacrylate), and poly (
t-butyl methacrylate) systems, and this order was in line with that of
Tg of the polymer matrices. From these results, it was concluded that the molecular motion of chain segments of matrix polymer played an important role in the photosensitivity of the polymer-aromatic azide systems.
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