Hexamethyldisiloxane (M
2) and octamethylcyclotetrasiloxane (D
4) were used as monomers, and plasma polymerized films were deposited on porous substrates under various polymerization conditions (with changing sample positions, monomer pressure, radio frequency power, and polymerization time). Deposition rates of the plasma polymerized films and gas permeability characteristics for oxygen and nitrogen of the composite membranes were examined, in order to determine effects of polymerization conditions on gas permeability. The polymerization time required to obtain permselective membranes became shorter at the positions nearer to an RF electrode. Deposition rates of M
2 increased with increasing the value of RF power/monomer pressure. In the case of D
4, such relationships were not observed. When the pressure was high, the RF power determined the deposition rates of D
4. When the pressure was low, the deposition rates were independent of the RF power and were determined by monomer supply. Under the condition of supplying excessive energy to monomers, drops in deposition rates and permselectivity were observed. The membranes prepared under the conditions giving high deposition rates showed high permselectivity.
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