巻号一覧
28 巻 (1991)
- 6 号 p. 414-
- 5 号 p. 310-
- 4 号 p. 252-
- 3 号 p. 184-
- 2 号 p. 98-
- 1 号 p. 2-
前身誌
28 巻, 5 号
選択された号の論文の9件中1～9を表示しています
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総論「歴史, 現状, 将来展望」津守 利郎1991 年 28 巻 5 号 p. 310-319
発行日: 1991/09/30
公開日: 2010/09/27
ジャーナル フリーIn the last decade, semiconductor chip density has increased dramatically through improvement of the pattern delineation technology that is called lithography. The progress of the lithography technology has been encouraged by the improvement of stepper technology and the resist materials. At present 0.5μm lithography has been achieved in manifacturing level and 0.35μm lithography in R&D level. This paper describes the recent significant progress of the lithography technology and its future prospect, especially with the focus on stepper and resist materials.抄録全体を表示PDF形式でダウンロード (2730K) -
直接描画による超微細画像形成技術内田 文雄, 水野 文夫1991 年 28 巻 5 号 p. 320-328
発行日: 1991/09/30
公開日: 2010/09/27
ジャーナル フリーDirect exposure method of E-beam lithography is widely used for R&D of next generation ULSIs, production of ASICs and gate writing of GaAs FETs. The features of direct exposure method and its example applied to the production of ASICs will be presented in this paper.抄録全体を表示PDF形式でダウンロード (1774K) -
マスクによる超微細画像形成技術中田 富紘1991 年 28 巻 5 号 p. 329-337
発行日: 1991/09/30
公開日: 2010/09/27
ジャーナル フリーAs a pattern formation technology, the exposure method using photo masks is superior in productivity to any other methods, so it has been utilized in many kinds of industrial fields for a long time. This paper describes about various masks and pattern formation technologies using them in the field of ULSI. Photolithography has been changed from the contact printing to the proximity and mirror projection. At the present time, the optical stepper lithography is the main method for ULSI production and it will be making rapid progress to the phase shift and excimer laser lithography. X-ray, electron-beam and ion-beam lithographyies using masks are expected for next methods to print fine patterns less than a quater micron.抄録全体を表示PDF形式でダウンロード (2299K) -
レジスト材料の進歩と展望宮村 雅隆1991 年 28 巻 5 号 p. 338-344
発行日: 1991/09/30
公開日: 2010/09/27
ジャーナル フリーRecently, chemical amplified resists for KrF excimer sensitive are proposed. It is found that this resist system is able to fabricate sub-micron VLSI pattern. This paper shows properties and drawback points of the chemical amplified resist. These resists have following properties 1) high sensitivities for deep UV region 2) high resolution. However, this system has many drawback points compared with g- and iline conventional resists, such as being to fine control the thermal budget in the backing process and being to affect atmosphere after the UV exposure. It is necessary to improve the drawback points to use the VLSI process.抄録全体を表示PDF形式でダウンロード (2046K) -
James R. Huntsman1991 年 28 巻 5 号 p. 345-357
発行日: 1991/09/30
公開日: 2010/09/27
ジャーナル フリーThe method herein for determining dot area colorimetrically differs substantially from modified Neugebauer-based methods, and from the Neugebauer approach in general in that they involve all three CIE XYZ values in solving multiple equations simultaneously. This new method demonstrates the use of tristimulus values normalized to the substrate as the reference white to determine the white component present and to use the white component to indirectly determine the effective area of the colorant. This method is not concerned with the hue of the colorant but rather with determining how much relative area of the pixel element's white substrate is occupied by a colorant, or, from another perspective, simply is not white. Thus, any binary halftone-like or dithered tint of a colorant can be considered to comprise only two areas: (1) the substrate (“white”) and (2) the colorant (“not-white”). Since the sum of their relative percent areas at any gradation equals 100, the effective, relative area of the colorant can be determined from a metric of the relative amount of the substrate (“white”), regardless of the hue of the colorant.抄録全体を表示PDF形式でダウンロード (2639K) -
Wladyslaw SKARBEK, Takeshi AGUI, Masayuki NAKAJIMA1991 年 28 巻 5 号 p. 358-365
発行日: 1991/09/30
公開日: 2010/09/27
ジャーナル フリーPABIC, a technique for progressive coding and transmission of binary images, is presented. This technique uses the majority and center rules for image size reduction and the Q-Coder for coding. On standard CCITT documents, IBM's ABIC algorithm, applied independently to each reduced copy of the image, produces about 30% longer code than PABIC. While giving on average 2% worse results than Japanese KDD algorithm, PABIC has simpler and faster software implementation and less complex hardware design as well.抄録全体を表示PDF形式でダウンロード (763K) -
永山 剛, 湯浅 友典, 三品 博達1991 年 28 巻 5 号 p. 366-375
発行日: 1991/09/30
公開日: 2010/09/27
ジャーナル フリーA computer simulation method is proposed to predict halftone reproduction properties, taking account of the effect of light scattering in paper, halftone dot shape and screen period on tonal appearance by using computer image processing technique. The simulation method is based on the principle of the analytical calculation method suggested by Ruckdeshel et al. The gray scales modulated by same dot patterns as the computer simulation by using a laser printer are generated to study experimentaly the relation between the optical dot gain and the halftone dot shape. The simulation data are compared with experimental data. It has been shown from this study that the optical dot gain is closely correlated with the perimeter of the dot pattern and the width of optical point spread function of paper. The correlation between the dot gain and the perimeter is very strong and the change of the optical dot gain is predicted by measuring the perimeter to some extent when the point spread is very smaller than the screen ruling period. The correlation become weaker as the point spread become wider than the half size of the ruling period.抄録全体を表示PDF形式でダウンロード (1047K) -
画像の鮮鋭度について三宅 洋一1991 年 28 巻 5 号 p. 376-381
発行日: 1991/09/30
公開日: 2010/09/27
ジャーナル フリーSharpness is one of the most important factor for the evaluation of image quality. Various physical parameters, such as MTF, acutance, PSF, resolving power and delta histogram have been proposed and used for the evalution of the sharpness of the image. In this paper, definition of the sharpness and those various parameters are introduced and described. Color images modulated by Gaussian filters with different spatial frequency characteristics are shown and the relationship between MTF and sharpness of those obtained images are also described.抄録全体を表示PDF形式でダウンロード (1987K) -
PS版について諏訪 孝昭1991 年 28 巻 5 号 p. 382-387
発行日: 1991/09/30
公開日: 2010/09/27
ジャーナル フリーThis paper is concerned with conventional PS plate for offset printing. The structure of PS plate and the plate making process are explained. Especially, the control methods of exposure and development which have influence on the printing quality are detailed.抄録全体を表示PDF形式でダウンロード (2519K)
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