A photocatalyst absorbs light and promotes a chemical reaction. Photocatalysis has received much attention in recent years because of its pollutant degrading properties, which offer important economic benefits. Although titanium dioxide is the most used photocatalyst, it is difficult to use indoors because illumination by ultraviolet rays produces its photocatalytic functions. One method of using it indoors is to use visiblelight-responsive photocatalysts. Cuprous oxide-decorated tungsten trioxide, a candidate material, has been studied extensively and has been identified as highly photocatalytic material under visible light. This paper presents a new method of decorating cuprous oxide using a solution plasma. Using the solution plasma process, cuprous oxide-decorated tungsten trioxide was synthesized in 10 min. Then it decomposed 85% of organic substances in 4 hr under visible light irradiation. This catalyst showed superior photocatalytic performance to that of commercial titanium dioxide under visible light irradiation of the same wavelength.

Diamond-like carbon（DLC）film was deposited on organic substrates using highpower impulse magnetron sputtering（HiPIMS）without substrate bias voltage. The DLC film properties were evaluated using Raman spectroscopy and X-ray photoelectron spectroscopy. Results show that the sp³ contents of the DLC films on PTFE or PA6 substrates were greater than those on POM substrate. The ion energy distribution functions（IEDFs）of carbon ion and argon ion were measured using energy-resolved mass spectrometry to evaluate high-energy ion production. From HiPIMS, high-energy carbon ion with more than 30 eV was detected, whereas argon ions were distributed in the low-energy region. Comparison of the IEDFs of carbon and argon ions in HiPIMS to those obtained using direct current magnetron sputtering confirmed that higher-energy carbon ions, which contribute to increased sp³ bonding, were produced with higher intensity in HiPIMS.

An electrostatic discharge（ESD）causes physical defects in electrical devices and lowers their production yields in the semiconductor industry. Although ESD problems inherent in device production cannot be eliminated entirely, various countermeasures against ESD can be undertaken. Many aluminum members with alumite treatment are used to build equipment and fixtures in semiconductor facilities. The ESD behaviors and tribological properties of an alumite and a DLC on the alumite were investigated. Results show that electrostatic is not charged on an alumite by a corona discharge test despite the high surface resistance. However, a slow charge and discharge behaviors were observed by coating a DLC on the alumites. Dielectric strength and hardness were enhanced. Friction coefficients against SUJ2 and alumina balls were reduced by less than a quarter by coating the DLC on the alumites. The promotion of DLC coating on an alumite in the semiconductor industry can present solutions to avoid and mitigate ESD damage and to improve tribological properties.