This study investigated the behavior of isocyanide additives, which have
π acidity, as stabilizers in an Electroless Nickel (EN) Plating bath.
Stabilization using five isocyanide additives (1-isocyanobutane, tert-butyl isocyanide, 2-isocyano-2,4,4-trimethyl pentane, isocyanocyclohexane and isocyanomethyl benzene) was investigated. All these additives suppressed decomposition in an EN plating bath. Concentrations of 1–100 μmol/L kept deposition proceeding and suppressed decomposition, demonstrating that isocyanide additives can function as stabilizers in an EN plating bath.
Polarization curves were produced to show EN plating bath stabilization characteristics attributable to tert-butyl isocyanide. It suppressed both anodic and cathodic reactions, which suggests that the stabilization of an EN plating bath using isocyanide additives is characterized by the suppression of both anodic and cathodic reactions.
The suppressive effect of isocyanide additives was also examined in comparison to those of nitrile additives, which are isomers with a CN bond instead of the NC bond of isocyanide. Nitrile additives showed no suppressive effect on decomposition. Analysis of the polarization curve reveals that although these additives suppress the cathodic reaction somewhat, they do not suppress the anodic reaction at all, which indicates that the stabilization effect of isocyanide additives on an EN plating bath is generated by the NC bond in the additives.
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