表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
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69 巻, 8 号
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小特集／生体材料の表面処理
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  • A Rotating Ring Disk Study of Accelerators with Cl－ and Br－ for Copper Damascene Electrodeposition
    Anh Van Nhat TRAN, Ha Van HOANG, Tetsuji HIRATO, Kazuo KONDO
    2018 年 69 巻 8 号 p. 352-355
    発行日: 2018/08/01
    公開日: 2019/02/01
    DOIhttps://doi.org/10.4139/sfj.69.352
    ジャーナル フリー
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    The acceleration effects of bis（sodiumsulfopropyl） disulfide（SPS） and its derivatives in the presence of Cl－ and Br－ were studied using a rotating ring disk electrode（RRDE） in a CuSO4/H2SO4 solution. The positive ring current increased with the addition of accelerators providing that the Cu（I） thiolate complex was formed during the dissolution step of electrodeposition. SPS and mercaptopropylsulfonic acid（MPS） show better acceleration effect with Cl－ while propane-1,3-disulfonic acid（PDSH） has higher acceleration effect with Br－. The highest acceleration effect is achieved with 4 ppm of PDSH and 50 ppm of Br－. Copper electrodeposition, which was conducted using periodic pulse reverse current waveform with Ion ＝－20 mA/cm2, achieved perfect filling with 2 ppm of PDSH and 50 ppm of Cl－ in which the ring currents measured at dissolution step are significant. Results show that the cuprous complexes which formed during the dissolution step hastened via-filling.

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