表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
検索
詳細検索
OR
閲覧
検索
61 巻, 5 号
選択された号の論文の9件中1～9を表示しています
すべての抄録を表示する
    • |<
    • <
    • 1
    • >
    • >|
小特集／プリント配線板におけるめっき膜厚の制御技術
総説
解説
研究論文
  • Electrical and Mechanical Characteristics of Co-Doped and Ni-Doped Carbon Thin Films
    Mitsunori YABE, Shigeru UMEMURA, Shigeru HIRONO
    2010 年 61 巻 5 号 p. 379
    発行日: 2010/05/01
    公開日: 2010/11/30
    DOIhttps://doi.org/10.4139/sfj.61.379
    ジャーナル フリー
    抄録を表示する抄録を非表示にする
    To create conductive and wear-durable carbon thin films using metal doping, we deposited Co-doped and Ni-doped carbon thin films onto silicon substrates by RF sputtering. Then we evaluated the dopant concentrations, resistivity, scratch hardness, carbon sp2 and sp3 bonding fractions, and the microscopic structure of the films. The resistivity of the Co-doped film remarkably decreased compared to that of non-doped carbon film when the dopant concentration was 1 at.% and it slightly decreased when the dopant concentration increased. The Ni-doped film resistivity decreased when the dopant concentration increased. The scratch hardness of the Co-doped and Ni-doped films was approximately equal to that of the non-doped film when the metal concentrations of the films were less than 6 and 5 at.%, respectively. The scratch hardness of the Co-doped film was degraded slightly as the dopant concentration became greater than 7 at.%. However, the scratch hardness of the Ni-doped film was significantly degraded when the dopant concentration was greater than 7 at.%. The Co-doped film with dopant concentration less than 12 at.% was most suitable from a practical perspective because of its low resistivity and high scratch hardness.
    抄録全体を表示
    PDF形式でダウンロード (945K)
ノート
速報論文
    • |<
    • <
    • 1
    • >
    • >|
feedback
 Top