Base material surface conditions affect the reactivity and deterioration of a platinum plating electrode. After platinum plating electrodes are blasted during anchoring treatment, the blast material might or might not be removed. The surface conditions of the base material are consid ered to differ depending on the presence or absence of the blasting material removal step. Moreover, it is highly probable that the platinum plating electrochemical characteristics change. Therefore, this study investigated the influence of the presence or absence of the blast material on the platinum plating reactivity. Results demonstrated that the presence or absence of the blast material can lead to differences in properties of the platinum plating or the oxide film. Furthermore, platinum plating without the blast material exhibited better reaction characteristics than without. Because of the substrate surface roughness, the platinum plating and oxide film properties and reaction characteristics differ depending on the change in the current distribution during electroplating.
Preparation and lightfastness of anodized aluminum（alumite）colored with organic pigment were investigated. Alumite was prepared by anodic oxidation of aluminum in oxalic acid solution, followed by pore-widening with the oxalic acid solution at 50 ℃. Pigment particles were dispersed by a surfactant with an azobenzene moiety（AZPEG）. The pigment particles were deposited on the barrier-layer surface of the alumite pore by electrochemical reduction of AZPEG. Using this method, alumite was colored with pigments of 15 kinds.
The color difference of 400 h light irradiation by xenon arc lamp was less than 2, which indicated that alumites colored with pigments have excellent lightfastness.
A SrGa2S4:Eu scintillator was fabricated by electrophoretic deposition of SrGa2S4:Eu particles dispersed in ethanol medium on a Ga:ZnO（GZO）/SLG substrate. The scintillator emitted visible light at wavelength of 533 nm when irradiated with 320-nm-ultraviolet light, and showed a spatial resolution of approximately 6 μm L/S for X-ray imaging with increased light emission intensity.