A generating process for oxide ultra fine particles (UFP), particulary SiO
2 and In
3O
3 is studied using an arc discharge method with a shield gas nozzle as an electrode. The arc is generated between the tungsten electrode cathode and a bulk material anode in an argon-oxygen atmosphere and an argon gas flowing in the shield gas nozzle. Pure Si and In are used as the bulk materials.
The results obtained are as follows:
(1) SiO
2 UFP of high purity are obtained by shielding the tungsten electrode with argon gas.
(2) Oxygen content in the mixed gas, to obtain In
2O
3 UFP of high purity, is about 10vol% at 125g/h of the generation rate with a 100A current.
(3) A composition of In
2O
3-SnO
2 complex UFP that can be obtained using this method is definitely affected by the vapor pressure of the bulk metal oxides.
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