Control of chemical contaminant has become of great importance in addition to particle contamination in a clean room for manufacturing semiconductors, liquid crystal device and other electronics devices. In particular, acid gases, base gases, hydrocarbon gases, boron and phosphor could damage electrical properties of these devices. Therefore, the reduction of contaminant concentration in clean room air is required. In this paper, constitute materials for a clean room newly developed as countermeasure for chemical contamination are introduced. Then, their analysis and evaluation methods for chemical contamination are also described.
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