Chemical vapor deposition (CVD) is generally employed to prepare thin films, whereas CVD can also prepare nano-particles by homogeneous nucleation in a gas phase or on support powder as catalyst. Although fluidized-bed CVD (FBCVD) has often been used to prepare particle/film on fluidized powder, the powder size of FBCVD is rather limited to several 10 to 100μm in diameter to fluidize powder in a gas phase. We have developed Rotary CVD (RCVD), which has no limitation of powder size to deposit. Ni nano-particles a few nanometer in diameter were prepared on Al
2O
3, mesoporous silica and Zeorite powders by RCVD using Nickelocene precursor. Ni nano-particles were deposited inside mesoporous silica showing more than 6 times higher H
2 production by steam methane reforming reaction than that of conventional Ni catalyst.
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