Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Volume 7, Issue 2
Displaying 1-22 of 22 articles from this issue
  • YOSHIO IMAI
    1994 Volume 7 Issue 2 Pages 251-256
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    This paper reviews recent progress in synthetic methods for aromatic polyimides in terms of conventional two-step, one-step, and three-step process where tetracarboxylic acid derivatives or diamine derivatives are used as starting materials with some emphasis on author's works.
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  • YUKISHIGE KITANO
    1994 Volume 7 Issue 2 Pages 257-260
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    A review is given on the application of molecular simulation technique to calculate the crystal structure of polyimides showing some selected examples, which include a comparison between molecular sumulation technique and X-ray diffraction analysis of the rigid-rod aromatic heterocyclic polyimide, a structural characterization of an ordered aromatic polyimide, ‘Kapton’, and an X-ray structural analysis of a thermoplastic polyimide.
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  • SEI-ICHI MUKAI
    1994 Volume 7 Issue 2 Pages 261-272
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    The process for the formation of high-modulus structure was re-examined through the cast films fabrication study for poly bis 2, 2′-disubstituted biphenylene pyromellite imides (PBPPI-XX: substituents). As the result, it has been clarified that the imide-cyclization behaiviors during intermediate curing zone below 250°C play influential parts and the introduction of volumetrically moderate substituents like methyl group and so on are helpful for the improvement of tensile properties. The reason can be consistently explained from TMA diagrams in this intermediate curing zone rather than from WARD profiles.
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  • TAKASHI YAMASHITA, HAN-SUNG YU, HIROSHI YOSHIMOTO, KAZUYUKI HORIE
    1994 Volume 7 Issue 2 Pages 273-274
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
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  • MASATOSHI HASEGAWA, TAKAFUMI MATANO, YOICHI SHINDO, TOKUKO SUGIMURA
    1994 Volume 7 Issue 2 Pages 275-280
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    The degree of in-plane molecular orientation of the unstretched polyamic acid(PAA) films and the corresponding polyimide (PI) film cured thermally have been quantitatively estimated by measuring the dichroic ratio of a rigid-rod dye (perylenebisimide) dispersed molecularly in their films at an incidence angle. Thermal imidization of PAA(BPDA/PDA) cast on a substrate enhanced markedly the degree of in-plane orientation of the PI chains, meaning that spontaneous in-plane molecular orientation occurred without stretching of the film. However, no spontaneous in-plane orientation was observed for BPDA/ODA system as well as PMDA/ODA system. Thus, it was found that the spontaneous orientation behavior depends strongly on the PI chain rigidity or linearity in contrast to that the degree of in-plane orientation for various PAAs is essentially independent of the chemical structure. PI(BPDA/PDA) cured in free-standing showed the degree of the in-plane orientation much smaller than the PI film imidized on a substrate.
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  • Tomoyuki Yuba, Shiyoshi Yokoyama, Masa-aki Kakimoto, Yoshio Imai
    1994 Volume 7 Issue 2 Pages 281-284
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
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  • YOICHI SHINDO, MASATOSHI HASEGAWA, YOICHI SONOBE, TOKUKO SUGIMURA
    1994 Volume 7 Issue 2 Pages 285-292
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    The intermolecular crosslinks and the changes in polymer coil dimension during the competitive intra-and intermolecular photocrosslinking reactions were studied for polyimides of benzophenoneteracarboxylic dianhydride with oligomers having various degrees of bis(aminopropyl) polydimethylsiloxane (BAPSX, n=8, 15, 61) in tetrahydrofuran under u.v.irradiation at 30°C. The magnitude of Mw, <s2>1/2, and A2 was evaluated by a light-scattering measurement. The deviation of the intermolecular crosslinks from linearity during the reaction becomes more pronounced as the initial polymer concentration decreases or the number of BAPSX oligomers in a polyimides increases. The value of Φinter/[C]θ for a polyimide with a BAPSX oligomer (n=8) was determined to be 6.7×102 dm3 mol-1 in the early stage of crosslinks formation. The extent of the contraction of polymer coils due to intramolecular crosslinking increases as the number of BAPSX oligomers in a polyimide decreases.
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  • Tsuguo YAMAOKA, Shoichi YOKOYAMA, Toshihiko OMOTE, Kazuhiko NAITOH
    1994 Volume 7 Issue 2 Pages 293-298
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
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  • Hiroyuki Hiraoka, Stefan Lätsch, Mariana Sendova
    1994 Volume 7 Issue 2 Pages 299-308
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    Pulsed laser applications to surface modifications have been practised for many years with carbon dioxide laser in materials processings such as drilling, welding, cutting and surface treatment by its thermal effect. However, with advent of pulsed UV-laser which includes excimer lasers and Nd:YAG laser in 3rd and 4th harmonic modes, pulsed laser application to surface modification becomes more precise, and fine-tuned, as has been well demonstrated by clean wall-profile of ablated holes made by an excimer laser in comparison with those by carbon dioxide IR-laser. Our interest here ranges from nano-structure fabrication using pulsed polarized laser beams to metal deposition on fluorocarbons and to crystalline diamond deposition from plumes generated by an excimer laser photoablation of polymers in presence of reactive species. These studies will be reviewed with those of other groups.
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  • V.N. VASILETS, T.I. YURANOVA, A.N. PONOMAREV
    1994 Volume 7 Issue 2 Pages 309-314
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    Changes in wettability and surface structure of Siloxane polymers under vacuum ultraviolet (VUV) irradiation (wavelength 147nm) and storage in water were investigated by contact angle measurements and ATR FTIR spectroscopy. The increase of wettability observed after VUV irradiation is associated with the formation of CO and OH polar groups in the polymer surface layer. Storage in water and air media of VUV treated samples leads to the increase of contact angle which could be related to dissolution of small highly polar fragments in water or to decomposition of unstable products of photooxidation. Correlation of contact angle changes with the water content in the polymer surface layer observed during storage in water for untreated samples leads to the conclusion that in this case water sorbtion is the major path to wettability changes.
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  • MASAYUKI KUZUYA, JUNJI NIWA, YUKINORI YAMAUCHI, SHIN-ICHI KONDO
    1994 Volume 7 Issue 2 Pages 315-318
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
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  • MASAAKI KATOH, TAKEO OHTE, AKIRA KOJIMA, SUGIO OHTANI
    1994 Volume 7 Issue 2 Pages 319-326
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    This investigation was conducted on the surface modification of various carbon by radio-frequency (13.56MHz) glow discharge plasmas with the objective of investigating the effects of fluoric gas plasmas on carbon surfaces and the mechanism of the elapsed variations of the various carbon surface after the plasma treatment. The surface of various carbon was treated by fluoric gas plasmas(SF6, CF4, C2F6, CHF3). The contact angles of water to the each carbon surface after the plasma treatment were measured and their elapse changes were investigated. The contact angle of three materiales increased by fluoric gas plasmas. CHF3 plasma was the most effecient of the plasmas we used. AG plate showed the largest angle in this case. Next we investigated the elapsed change of contact angle of each carbon material after CHF3 plasma treatment. The contact angle change with time was almost constant. The reasons for the elapsed changes are as follows. Three types in relation to the attachment of F atom are considered. In two types F part from the surface of materials. As a result, F quantity in surface decreases, and the contact angle reduces.
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  • TAKEO OHTE, MASAAKI KATOH, YORI IZUMI, SUGIO OHTANI, AKIRA KOJIMA
    1994 Volume 7 Issue 2 Pages 327-336
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    This investigation was conducted on the accurate control of the surface characteristics of the glassy carbon (GC) by radio- frequency (13.56MHz) glow discharge plasmas. We developed two methods of controlling surface characteristics. These were the mixed gas (SF6+O2) plasma treatment method and two-step plasma (SF6 plasma, O2 plasma) treatment method. The contact angle of water to the GC surface was controlled by these methods. The mixed gas plasma method was the best, because the control of the contact angle is easy and wide, and the contact angle change with time after the plasma treatment could be minimized by this method.
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  • G.K. Vinogradov, S. Gorwadkar, K. Senda, S. Morita
    1994 Volume 7 Issue 2 Pages 337-340
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
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  • M. KOGOMA, K. KOIWA, S. OKAZAKI
    1994 Volume 7 Issue 2 Pages 341-344
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    SiNx thin films have been deposited by using glow discharge with He/SiCl4/N2/H2 and He/SiCl4/NH3 gas systems under atmospheric pressure. With the He/SiCl4/N2/H2 system, the SiNx films were obtained at 40°C which have as good quality as the that of those obtained in low pressure glow discharge. In the case of He/SiCl4/NH3 gas system, we got films of the same quality with lower temperature about 25°C in that of the He/SiCl4/N2/H2 system. Because NH3 (N-H bonds) has the lower bond strength than N2(N-N bond) and H2(H-H bond), NH3 is easily dissociated to make NH and H radicals in plasma and easily abstracts the Cl atoms 2 from SiCl4. That is the reason why attained the lower temperature deposition could be in the containing NH3 gas system.
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  • TAKAO HIRAIDE, HIDEO YAMADA
    1994 Volume 7 Issue 2 Pages 345-352
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    Organosilicon compounds were deposited in an RF cathode coupled plasma using Tetramethoxy silane. The films were deposited on silicon and glass substrates in negative self-bias voltages over the range of -80V to -580V. The deposited films were highly crosslinked and optically highly transparent between optical wavelengths from 420nm to 1000nm when oxygen was infused with the monomer.
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  • KEISUKE ISHII, YOSHIMICHI OHKI, TOSHIKI NAKANO
    1994 Volume 7 Issue 2 Pages 353-360
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    In order to make clear the breakdown mechanism in plasma polymer films of ethylene and those of ethylene and trifluoromethane, high-field conduction, dielectric breakdown and photoconduction characteristics were studied. The attention was given to the determination of carrier species which causes avalanche. It was found that all these characteristics depend on the anode metal. When the anode is aluminum, the barrier height for tunneling injection obtained from the Fowler-Nordheim relation is higher than the gold anode. The aluminum anode also has a higher dielectric strength and a longer time lag to breakdown than the gold anode.
    From these results, together with the effect of the shape of illuminated electrode on photocurrent, it is considered holes are injected through tunneling from the anode by high electric stress applied and that avalanche is caused by these holes.
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  • TETSUMI SUMIYOSHI, YUTAKA NINOMIYA, HIROSHI OGASAWARA, MINORU OBARA
    1994 Volume 7 Issue 2 Pages 361-368
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    Ablation of organic polymers (PES: polyether sulphone, PEEK: polyether ether ketone, and ETFE: ethylene tetrafluoroethylene) by an oscillation line of selected TEA CO2 lasers is successfully demonstrated. The ablative etch rate slopes were varied with different irradiation conditions such as incident laser intensity and ambient gas. As an application of the ablation processing, spatial periodic structure is fabricated on the surface of the PEEK film by two-beam interference irradiation of the TEA CO2 laser. It is found that the fluorocopolymer modified by copolymerization has a significant absorption in the oscillating wavelength region of the TEA CO2 laser and it can be ablated efficiently.
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  • HIROYUKI NIINO, AKIRA YABE
    1994 Volume 7 Issue 2 Pages 369-372
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
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  • SHINGO INOUE, TAKEO FUJII, YOSHIAKI UENO, FUMIHITKO KANNARI
    1994 Volume 7 Issue 2 Pages 373-380
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    Crystalline thin films of polytetrafluoroethylene were deposited on Si (100) wafers by F2 laser (157nm) ablation. X-ray photoemission spectra indicated that the composition of deposited films was similar to the source material. The surface morphology of films deposited at room temperature contained numerous fibrous structures in size of 100-400nm, but they were smoothed out at elevated wafer temperature of -370K. The refractive index was -1.35 at 633nm. Ionized fragments in the ablation plume were measured by a Faraday cup assembly, but their effect on the deposited films was not observed at the present ionization ratio.
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  • Masayuki OKOSHI, Masataka MURAHARA
    1994 Volume 7 Issue 2 Pages 381-388
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    Polyethylene surface in water(H2O) ambience was photochemically modified to be hydrophilic using an ArF excimer laser light. The hydrogen atoms of the surface, were pulled out by the hydrogen atoms which were photodissociated from H2O and replaced with the OH radicals which were also photodissociated. The substitution of OH radicals was confirmed by the XPS and the contact angle measurement. Also, chemical bonding of the surface with epoxy adhesive was performed to obtain a shearing tensile strength of 9.5kgf/cm2.
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  • SATOSHI INAZAKI, TOMONORI OIE, HIDETSUGU TAKAOKA
    1994 Volume 7 Issue 2 Pages 389-396
    Published: 1994
    Released on J-STAGE: August 04, 2006
    JOURNAL FREE ACCESS
    PTFE surface property was modified from hydrophobicity to high wetting ability by ArF excimer laser irradiation in Monosodium L- Glutamate Monohydrate (L-Glutamate) solution and in ethyl alcohol solution. The wetting ability of the processed surface was examined by the water contact angle method. The contact angle of the film was improved from 120 degree to 0 degree. By XPS analysis it was shown that amino groups, carbonyl groups, ethylene linkages were substitutionally formed with the release of fluorine atom on the surface. These hydrophilic molecules formed on the processed surface are believed to make the surface hydrophilic. The processed surface showed its original appearance without any stain and physical damage. Spatial resolution of 1μm is obtained with this method.
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