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2011 JSPE Autumn Conference

Displaying 51-100 of 507 articles from this issue

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Contact Detection of Tip Position on Cutting Tool Using Acoustic Emission Signal

Toshihiko Koga, Alan Hase, Masaki Wada

Session ID: C38
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.103.0

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Relationship between Edge Shape of Knife and Cutting Characteristics of Tape

Toshitaka Kurabayashi, Hitoshi Suwabe, Ken-ichi Ishikawa

Session ID: C44
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.105.0

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Improvement of Cutting Performance of Electroplated Blade Reinforced by Metal Films

Zhang Yu, Yasuhiro Tani, Junji Murata, Hirofumi Kanai

Session ID: C45
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.107.0

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Basic study on drum-type manufacturing method for electroplated diamond wire tools

Shengmiao Yang, Yasuhiro Tani, Yu Zhang, Junji Murata, Okiharu Kirino

Session ID: C46
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.109.0

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Study on Slicing Characteristic of Multidirectional Glass Fiber Reinforced Plastics

Mitsugu Yamaguchi, Satoshi Sakamoto, Hiroshi Usuki, Yasuo Kondo, Kenji ...

Session ID: C47
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.111.0

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Effect of Pressure in laser Cleaving of Glass Substrate

Shinya Nagasue, Keiji Yamada, Katsuhiko Sekiya, Yasuo Yamane

Session ID: C48
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.113.0

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[title in Japanese]

Hiroshi Masuda

Session ID: F02
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.115.0

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A Data Management Method for Efficient Search and Rendering of Multiple Large Scale Point Clouds

Takashi Maeno, Hiroaki Date, Satoshi Kanai

Session ID: F03
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.117.0

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[title in Japanese]

Kunihiko Ikeda, Hiroshi Masuda

Session ID: F04
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.119.0

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AS-build modeling using Manhattan-world assumption

Takanori Namatame, Kazuhiro Mizoguchi, Yosikazu Kobayasi, Kenzi Sirai

Session ID: F06
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.121.0

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Automatically Recognition of a Piping System from Laser Scan Data of Large-Scale Environments

Automatically extraction a piping system and recognition connection relationship

Kazuaki Kawashima, Satoshi Kanai, Hiroaki Date

Session ID: F07
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.123.0

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Surface Extraction from Multiple Laser Scanned Data

Hiroshi Masuda, Yuji Abe

Session ID: F08
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.125.0

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A study of object recognition using geometric models from 3D laser scan data of environments

a method of object recognition for point clouds using spin images

Yusuke Kaneta, Hiroaki Date, Satoshi Kanai

Session ID: F09
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.127.0

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Region-based Automatic Classification of Airborne LiDAR Data

Koutarou Ui, Satoshi Kanai, Hiroaki Date, Yasuhiro Yokoo, Norichika As ...

Session ID: F13
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.129.0

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Precision of Sphere Position Measurement by Phase-Based Laser Scanning (3rd Report)

Ichiro TANAKA, Hideto ISHITSU, Masakazu ENOMOTO, Hiroshi MASUDA

Session ID: F14
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.131.0

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Nano- and Micro-geometric Modeling with 3D Microscopy Measurement Data - Proposal of the ModelingNano

Kenjiro T. Miura, Yousuke Kawauchi, Shin Usuki

Session ID: F15
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.133.0

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Three dimensional microscopic imaging for nano-micro modeling

Wide field 3D structured illumination based on multi-beam interference

Hiroyoshi Kanaka, Shin Usuki, Kenjiro Miura

Session ID: F16
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.135.0

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[title in Japanese]

Tetsuya Ogura, Kiichirou Ishikawa, Yoshiharu Amano, Takumi Hashizume

Session ID: F18
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.137.0

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Toshinori Yamazaki, Kiichirou Ishikawa, Yoshiharu Amano, Takumi Hashiz ...

Session ID: F19
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.139.0

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Segmentation and Shape Modeling of Features ini Mobile Mapping Data

Kunihiko Ikeda, Saaya Yamashita, Hiroshi Masuda

Session ID: F20
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.141.0

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Pole-like Objects Recognition from Mobile Laser Scanning Data in Urban Environment

Hiroki Yokoyama, Hiroaki Date, Satoshi Kanai, Hiroshi Takeda

Session ID: F21
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.143.0

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Generation and Representation of Street Shapes for Mobile Mapping System Data

Jun He, Hiroshi Masuda

Session ID: F23
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.145.0

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Development of Mobile Robot System Equipped with Camera and Laser Range Finder Realizing Human Following and Autonomous Returning

Takahito Shimizu, Masashi Awai, Atsushi Yamashita, Toru Kaneko

Session ID: F24
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.147.0

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Fast simulation algorithm of Voxel representation method for multi axis control machining

Yoshitaka Tsuchitana, Jyunichi Kaneko, Kenichiro Horio

Session ID: F25
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.149.0

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[title in Japanese]

Kenji Takahashi

Session ID: F31
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.151.0

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A Study on the Resist Coat Method inside the TSV on the 3D Stack Device

Yoshiyuki Seike, Yoshinori Kobayashi, Keiji Miyachi, Futoshi Shimai, K ...

Session ID: F33
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.153.0

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Resist coating inside TSV in the fabrication process of 3D stack devices

- 2nd report: Measurements and applications using nano-imprinting of TSV patterns-

Toshiro Doi, Masanori Ohtsubo, Syuhei Kurokawa, Osamu Ohnishi, Michio ...

Session ID: F34
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.155.0

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Relationship Between Cut Rate and Sliding Distance at Pad Conditioning Process in CMP

Michio Uneda, Yuki Maeda, Tatsunori Omote, Ken-ichi Ishikawa, Toshiroh ...

Session ID: F36
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.157.0

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Study on evaluation method for surface topography of CMP polishing pad based on optical Fourier transform

Takashi Kushida, Keiichi Kimura, Panart Khajornrungruang, Keisuke Suzu ...

Session ID: F37
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.159.0

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Identification of nonlinear viscoelasticity of polishing pad using a compression tester

Norikazu Suzuki, Masakazu Asaba, Yohei Hashimoto, Eiji Shamoto

Session ID: F38
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.161.0

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Study on Quantitative Evaluation of Micro Deformation Distribution Characteristics for Polishing Pad Surface Texture

Relationship between Pad Micro Deformation Distribution Characteristics and Quantitative Evaluation results using Image Rotation Prism

Michio Uneda, Tatsunori Omote, Yuki Maeda, Ken-ichi Ishikawa, Toshiro ...

Session ID: F39
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.163.0

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Study on fine particle behavior in SiO₂ film CMP using evanescent field

Yoshikazu Idei, Keiichi Kimura, Keisuke Suzuki, Panart Khajornrungruan ...

Session ID: F43
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.165.0

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Study on Quantitative Evaluation of Slurry Flow Mechanism using Digital Image Correlation Method

Michio Uneda, Shintaro Murata, Tsutomu Yamazaki, Osamu Ohnishi, Syuhei ...

Session ID: F44
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.167.0

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Effect of chemical action and mechanical action in polishing (4)

Makoto Sato, Maiko Takahashi, Wataru Ohmori

Session ID: F45
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.169.0

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Polishing Mechanism on Oxide Optical Crystal CMP

Shinji Koga, Toshiro Doi, Syuhei Kurokawa, Osamu Ohnishi, Michio Uneda ...

Session ID: F46
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.171.0

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[title in Japanese]

Hideo AIDA, Hidetoshi TAKEDA, Seong-Woo KIM, Koji KOYAMA, Toshiro DOI

Session ID: F61
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.173.0

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Application of Byproduct from High Purity SiC Manufacturing Process as Polishing Slurry

Wang Zhida, Toshiro Doi, Syuhei Kurokawa, Osamu Ohnishi, Michio Uneda, ...

Session ID: F63
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.175.0

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Study on Sapphire CMP slurries using fullerenol as fine particles

Investigation of polishing performance based colloidal silica slurry

Takashi Saito, Keisuke Suzuki, Khajornrungruang Panart, Erika Karasuda ...

Session ID: F64
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.177.0

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Multistep chemical planarization for efficient fabrication of smooth GaN surfaces

Shun Sadakuni, Junji Murata, Yasuhisa Sano, Keita Yagi, Takeshi Okamot ...

Session ID: F66
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.179.0

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Gallium nitride (GaN) has attracted attention as a semiconductor material for energy-saving power devices. However, polishing methods with high-efficiency and accuracy have not been developed due to the mechanical hardness and chemical stability of GaN. We are developing a novel chemical planarization method which uses the surface of a catalyst plate as a reference surface to fabricate ultra-smooth GaN surfaces with high rate. We report the results of efficient planarization using two types of methods which have different processing mechanisms as the front-end and finishing processes respectively.

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High-efficiency planarization of GaN wafers using photo-electro chemical reaction with applying bias

Hiroya Asano, Shun Sadakuni, Yasuhisa Sano, Keita Yagi, Junji Murata, ...

Session ID: F67
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.181.0

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The development of polishing method for the silicon carbide substrate using controlled slurry under AC electric field -2nd report-

Takayuki Kusumi, Yasuhiro Sato, Yoichi Akagami, Noritsugu Umehara

Session ID: F68
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.183.0

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Authors have been developed a novel polishing method using functional fluids which are dispersed abrasives with silicone oil. This fluid shows active reciprocate motion between electrodes under AC electric field at very low frequency. In order to obtain the excellent silicon carbide substrate for next generation power semiconductor, we tried polishing test under AC electric field using the slurry that dispersed the silicon carbide abrasives with the silicon oil. We have confirmed the improved polishing rate in proportion to electric field strength, and the change for slurry characteristics by the solvent viscosity.

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Development of a Nondeforming Freezing Pin Chuck (5th Report)

Temperature distribution analysis of a chuck system and congealing deformation

Katsunori Takehana, Atsunobu Une, Nagahisa Ogasawara, Kenichiro Yoshit ...

Session ID: F69
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.185.0

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[title in Japanese]

Tomoko Akai

Session ID: F73
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.187.0

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Development of an AC electric Field-applied tribochemical polishing technology to promote high-efficiency polishing

Hiroshi Ikeda, Yoichi Akagami, Osamu Ohnishi, Syuhei Kurokawa, Toshiro ...

Session ID: F75
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.189.0

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Glass Polishing with CeO₂-ZrO₂-Y₂O₃ Nano-Composite Abrasive

Takayuki Honma, Seiichi Suda, Koichi Kawahara, Kumiko Kinoshita

Session ID: F76
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.191.0

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Cerium oxide is a suitable material for glass polishing because it has a high chemical reactivity and a suitable hardness for glasses. We focused on nano- dispersion abrasives containing both materials that specialize in a chemical reactivity with glass and a suitable mechanical property. In this study, we investigated glass polishing properties using CeO₂-ZrO₂-Y₂O₃ nano-composite abrasive. The glass removal rate was little lower than that using commercial CeO₂-based abrasive. However the smoother surface of polished glass was obtained using the nano-composite abrasive.

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Development of Novel Pad Groove Designs Induced High Efficiency CMP

Designing of New Groove Patterns and Image Analysis of Slurry Flow

Tsutomu Yamazaki, Toshiro Doi, Syuhei Kurokawa, Osamu Ohnishi, Michio ...

Session ID: F78
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.193.0

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[title in Japanese]

Takahiro Maruyama, Yu Moriwaki, Tsutomu Sawano

Session ID: F79
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.195.0

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Highly planarization for a large-sized wafer using oscillation-speed-control-type polishing

- Elucidation of removal rate characteristics to improve simulation accuracy -

Kenichiro Yoshitomi, Atsunobu Une, Masaaki Mochida

Session ID: F80
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.197.0

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Development of epoxy-urethane copolymer polishing pad

Nobuyuki Nomura, Ryouichi Hirokawa, Yasuhiro Tani, Junji Murata, Yu Zh ...

Session ID: F81
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.199.0

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Study on cutting work of tantalum materials

Influence of tool head shape on chips

Kazuhiro Shintani, Kazuki Sakai, Hideharu Kato

Session ID: G01
Published: 2011
Released on J-STAGE: March 05, 2012

DOIhttps://doi.org/10.11522/pscjspe.2011A.0.201.0

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