A gas-phase water-repellent silanization coating technique, which prevents the microscopic structures used for micro-sensors and micro-electro-mechanical systems (MEMS) from sticking to the silicon substrates and other microscopic structures during operation, have been developed. Use of a water-repellent coating is one method that prevents sticking by reducing the surface energy of the structure. The water-repellency characteristics of three types of organosilicon compounds were evaluated. It was found that a water-repellent silanization coating layer using (tridecafluoro - 1, 1, 2, 2 -tetrahydrooctyl) trichlorosilane (C
8H
4Cl
3F
13Si) had most excellent durability. It was confirmed that the water contact angle of C
8H
4Cl
3F
13Si coating layer is exceeding 90 degrees at surface of standard semiconductor materials except nickel. In addition, the C
8H
4Cl
3F
13Si coating layer can be patterned by ultraviolet irradiation.
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