It is known that infrared reflection absorption spectroscopy (IRAS) on semiconductor or insulator surfaces becomes practicable by using buried metal layer (BML) substrates, in which the metal thin film is buried under semiconductor or insulator films. In this work, IRAS has been measured for Langmuir-Blodgett films deposited on the BML substrate with SiO
2/Al/Si(100) structure and the observed spectrum intensity has been quantitatively compared with the calculation assuming the ideal multilayer structure for the BML Substrate. The BML-IRAS using CoSi2 has been adopted to the detection of SiH
n on the Si(100) substrate during synchrotron radiation (SR) stimulated Si
2H
6 gas source molecular beam epitaxy. It has been found that SiH
2 and SiH
3 on the Si(100) surface are easily decomposed by SR, but SiH can't be decomposed. From these experiments, it has been concluded that the BML-IRAS is an useful in situ observation technique for the photo-stimulated surface reactions.
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