Dynamics of ablation of fused silica by multiwavelength excitation process using F
2 and KrF excimer laser has been investigated by energy analyzed mass spectrometry of ablated species. The number of generated Si
+ ion by multiwavelength excitation process corresponds to that by single-F
2 laser ablation and to approximately 2.1 times higher than that by single-KrF excimer laser ablation. In addition, kinetic energy distribution of Si
+ ablated by multiwavelength excitation process shows almost same as that by single-F
2 laser ablation. We regard that absorption of KrF excimer laser by excited state generated by F
2 laser (excited-state absorption: ESA) causes effective photoionization, resulting in enhancement of Si
+ with higher kinetic energy and then in high-quality ablation.
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