The Review of Laser Engineering
Online ISSN : 1349-6603
Print ISSN : 0387-0200
ISSN-L : 0387-0200
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Volume 17, Issue 8
Displaying 1-10 of 10 articles from this issue
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  • [title in Japanese]
    Toshio GOTO
    1989 Volume 17 Issue 8 Pages 525-526
    Published: August 28, 1989
    Released on J-STAGE: March 17, 2010
    DOIhttps://doi.org/10.2184/lsj.17.8_525
    JOURNAL FREE ACCESS
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  • Detection of Free Radicals by Laser Techniques and Application to the Study of Elementary Processes
    Nobuaki WASHIDA, Gen INOUE
    1989 Volume 17 Issue 8 Pages 527-535
    Published: August 28, 1989
    Released on J-STAGE: March 17, 2010
    DOIhttps://doi.org/10.2184/lsj.17.8_527
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    The gneration and detection of free radicals and its application to the study of elementary processes of free radicals are described, with a particular emphasis on the use of lasers. For generation, atom-molecule reactions by a discharge flow method and photodissociation and IR multiphoton dissociation of molecules are discussed. For detection, laser-induced fluorescence (LIF) and laser absorption methods are described. Several problems for the application to the study of free radical kinetics are also pointed out.
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  • Applications of Laser Ionization Spectroscopy to Plasma Processing and its Related Fields
    Tatsuo OKADA, Mitsuo MAEDA
    1989 Volume 17 Issue 8 Pages 536-545
    Published: August 28, 1989
    Released on J-STAGE: March 17, 2010
    DOIhttps://doi.org/10.2184/lsj.17.8_536
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    Laser ionization spectroscopy (LIS) is known as a very sensitive technique for detection of atoms and molecules. Its applications to plasma processing and related fields are reviewed. Main topics are on the detection and the measurement of nonfluorescent radicals like CH3 and SiH3 in elementary processes by resonance ionization spectroscopy (RIS). Applications of LIS to surface characterization are also described briefly.
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  • Measurements of Reactive Plasma Parameters Obtained from Spectral Profiles of Particles by Laser Spectroscopy
    Katsunori MURAOKA, Chikahisa HONDA, Hee Je KIM, Yukihiko YAMAGATA, Mit ...
    1989 Volume 17 Issue 8 Pages 546-557
    Published: August 28, 1989
    Released on J-STAGE: March 17, 2010
    DOIhttps://doi.org/10.2184/lsj.17.8_546
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    The spectral line shapes of particles (atoms, molecules, or ions) in plasmas are determined froma radiative transition probability (natural broadening), a collision frequency (pressure broadening), an electric field (Stark broadening), a magnetic field (Zeeman splitting), and a velocity distributionfunction (Doppler broadening). In addition, the intensity ratios of spectral lines are due to thepopulation densities in electronic, vibrational, or rotational levels, which are related directly totemperature. Among these effects, Stark and Doppler broadenings and intensity ratios of spectrallines have been used for diagnostics of reactive plasmas to yield respective plasma quantities. In thispaper, the mechanisms of determining these effects are reviewed briefly, and a laser and other hardwarefor the measurements of spectral line shapes are then discussed, followed by typical examplesof the measurements in reactive plasmas, with comments for future perspective.
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  • Optogalvanic Spectroscopy as Applied to Diagnostics of Discharge Plasmas
    Shigeyuki SEKINE, Akihide WADA, Chiaki HIROSE
    1989 Volume 17 Issue 8 Pages 558-567
    Published: August 28, 1989
    Released on J-STAGE: March 17, 2010
    DOIhttps://doi.org/10.2184/lsj.17.8_558
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    The method of optogalvanic spectroscopy is reviewd with emphasis on the applications to the diagnosticsof discharge plasmas. The experimental procedures using CW and pulsed lasers are described.A brief review is given on such applications as to the measurements of unstable species andelectric field distribution inside cylindrical hollow cathode, and to the analysis of transient signalsdue to the local irradiation with laser pulses.
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  • LIF Study on the Spatial Distributions and Transport Processes of Radicals in Hydrocarbon Plasmas
    Kunihide TACHIBANA, Takuya MUKAI, Akimasa YUUKI, Yasuji MATSUI
    1989 Volume 17 Issue 8 Pages 568-577
    Published: August 28, 1989
    Released on J-STAGE: March 17, 2010
    DOIhttps://doi.org/10.2184/lsj.17.8_568
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    Laser induced fluorescence (LIF) spectroscopy has been applied to the diagnostics of plasmasused for thin-film preparation from hydrocarbon gases. From the absolute density and the spatialdistribution of CH radicals in a methane RF discharge plasma, their flux onto the substrate and contributionto the deposition were estimated. C2 and OH radicals produced in an C2H2/O2 flame werealso measured. A characteristic flame structure calld “feather”, in which carbon-containing radicalssuch as C2 exist in a fairly large amount, is typically seen under the deposition condition of diamondfilm.
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  • Laser-Induced Fluorescence Spectroscopic Study of Reactive Plasma
    The Absolute Density and Spatial Distribution of Si Atoms in Silane Discharge
    Yoshitaka TAKUBO, Manabu YAMAMOTO
    1989 Volume 17 Issue 8 Pages 578-585
    Published: August 28, 1989
    Released on J-STAGE: March 17, 2010
    DOIhttps://doi.org/10.2184/lsj.17.8_578
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    We used LIF spectroscopy to determine the absolute density and the spatial distribution of Siatoms in a dc and an rf glow-discharge in SiH4-He-Ar. The absolute sensitivity of the fluorescence detection system was calibrated by using Rayleigh scattering by Ar gas. The fluorescence quantum efficiency and the polarization degree of emitted light were measured to estimate the effect of collisions of Si atoms and buffer gas. The spatial distribution of the ground-state Si atom in the dc discharge is compared with that of the excited-state atoms. The distribution of Si atoms in the rf discharge is investigated for two types of electrode configurations.
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  • Measurements on Radio-Frequency Discharge Plasma of Silane by Coherent Anti-Stokes Raman Spectroscopy and Laser-Induced Fluorescence
    Nobuhiro HATA, Akihisa MATSUDA
    1989 Volume 17 Issue 8 Pages 586-594
    Published: August 28, 1989
    Released on J-STAGE: March 17, 2010
    DOIhttps://doi.org/10.2184/lsj.17.8_586
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    Coherent anti-Stokes Raman spectroscopy (CARS) is used to measure concentration profiles of molecules, time-dependent concentration changes, and temperature profiles in radio-frequency discharges of silane and some other gases, which are used to produce hydrogenated amorphous silicon and its related materials for electronic and opto-electronic applications. The results are discussed in terms of gas diffusion, dissociation and chemical reactions, as well as gas-phase thermal relaxation, thus giving an insight into the gas-phase kinetics involved in the material synthetic processes, which are important as the means for future process design and control. The advantages and limitations of CARS technique as a diagnostic tool for plasma deposition of materials are summarized, and the future scope of process diagnostics is discussed.
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  • Measurements of Non-Emissive Radicals in Silane Plasma Using Laser Absorption Spectroscopy
    Toshio GOTO, Eiji HIROTA
    1989 Volume 17 Issue 8 Pages 595-603
    Published: August 28, 1989
    Released on J-STAGE: March 17, 2010
    DOIhttps://doi.org/10.2184/lsj.17.8_595
    JOURNAL FREE ACCESS
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    Laser absorption spectroscopy is suitable for the direct determination of the absolute values of non-emissive radical densities. Using frequency-variable infrared diode lasers, we have measured for the first time the SiH3 radical density in silane plasma. This paper reviews the recent progress in the measurements of neutral non-emissive radicals SiHm (m=0-3) in silane plasma by laser absorption spectroscopy.
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  • [title in Japanese]
    1989 Volume 17 Issue 8 Pages plate1
    Published: August 28, 1989
    Released on J-STAGE: March 17, 2010
    DOIhttps://doi.org/10.2184/lsj.17.8_plate1
    JOURNAL FREE ACCESS
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