The fabrication and evaluation of an UV light-emitting diode (LED) with GaN quantum dots as the active layer is demonstrated. GaN quantum dots were fabricated on an Al
xGa
1-xN (x ~ 0.1) surface using Si antisurfactant. The Si antisurfactant exposed to the Al
xGa
1-xN surface prior to GaN enables quantum dot formation on a surface where growth in the Stranski-Krastanov mode is impossible. Fairly high density of dots (10
10-10
11 cm
-2) with controllable dot sizes can be achieved. By current injection (cw) to the LED structure including GaN quantum dots clear room temperature luminescence at 360 nm was observed. The origin of the electroluminescence is discussed by comparing it to photoluminescence measurements.
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