In order to get spectral information on the
in situ analysis of passive films on Ni, modulated reflection spectra from thin films of several Ni oxides and oxyhydroxides have been measured. Thin films of NiO, α- and β-Ni(OH)
2, γ-NiOOH·NiO
2, β-NiOOH, and γ-NiOOH·2NiO
2 were coated on Pt electrodes using various deposition techniques, and then their spectra were measured in 1 kmol·m
−3 Na
2SO
4 (pH 8.0 and 12.0) and 1 kmol·m
−3 NaOH (pH 13.7). Effects of composition and thickness of films on the spectra were examined.
It was found that the spectrum of each film had a characteristic structure; the spectrum for a NiO film formed by CVD technique showed a peak at 3.0 eV and a trough at 4.2 eV, that for a NiO
x (
x<1.5) film formed by an anodic oxidation of NiO only one broad peak at 3.4 eV, that for a γ-NiOOH·NiO
2 film formed by the anodic oxidation of α-Ni(OH)
2 a large sharp peak at 2.0 eV and two small peaks at 3.5 and 4.6 eV, that for a β-NiOOH film formed by the anodic oxidation of β-Ni(OH)
2 a large broad peak at 2.1 eV and two small peaks at 3.6 and 4.5 eV, and that for a γ-NiOOH·2NiO
2 film formed by anodic deposition also three peaks at 2.0, 2.5, and 3.4 eV. The spectra for α- and β-Ni(OH)
2, however, showed no characteristic structures.
Change in the thickness of the films has only an effect on the relative intensity of peaks in the spectra, except for a case in the spectrum for a NiO film at lower potentials.
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