Journal of The Japan Institute of Electronics Packaging
Online ISSN : 1884-121X
Print ISSN : 1343-9677
ISSN-L : 1343-9677
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Technical Paper
  • Hiroshi Shirouzu, Atsufumi Tanjo, Zhenxiong Weng, Koji Tamura, Kotaro ...
    Article type: Technical Paper
    2024 Volume 27 Issue 3 Pages 249-258
    Published: May 01, 2024
    Released on J-STAGE: May 01, 2024
    Advance online publication: January 30, 2024
    JOURNAL RESTRICTED ACCESS

    Plasma cleaners are used in the assembly process of semiconductors for the purpose of improving wire bondability and improving the adhesiveness of mold sealing resin.

    Plasma cleaners produce a less volatile reaction than semiconductor front-end processes in which wafers are plasma-processed, so polymer deposition in the chamber progresses faster. Dirt in this chamber will damage the workpiece being machined.

    On the other hand, from the viewpoint of preventive maintenance, it is necessary to perform maintenance according to the progress of polymer deposition in chamber, and since the degree of polymer deposition in the chamber was unknown, the timing of maintenance could not be estimated.

    Therefore, we report on a method for estimating the degree of polymer deposition in the chamber using a plasma monitor that measures changes in plasma impedance with an existing sensor required for machine operation.

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