Due to the demand for high-speed performance, 2.n/3D packaging is being developed. Silicon interposer plays an important role in 3D packaging. However, it is not widely used because of its high cost. Therefore, attention has been paid to using glass as a base material instead of silicon.
We have developed a metal oxide adhesion layer that enables wet chemical Cu metallization on glass. The adhesion layer is formed as a smooth and ultra-thin film (about 5–10 nm) by dip-coating. In addition, it has high peel strength of 4 N/cm or more and enables fine line formation (L/S = 9/9 μm), uniform conformal plating, and filling plating. Therefore, this process shows potential for use with glass interposer and glass substrate.
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