Journal of The Japan Institute of Electronics Packaging
Online ISSN : 1884-121X
Print ISSN : 1343-9677
ISSN-L : 1343-9677
Volume 13, Issue 3
Displaying 1-17 of 17 articles from this issue
Preface
Special Articles: Bio-sensing Devices Utilizing Nano-micro Chemical Spaces
Technical Papers
  • Dependence of Failure Modes of Solder Joints under Impact Load on Strain of PWB
    Akihiro Yaguchi, Hisashi Tanie, Yasuhiro Naka, Kenichi Yamamoto, Ryosu ...
    Article type: Technical Papers
    2010Volume 13Issue 3 Pages 204-212
    Published: May 01, 2010
    Released on J-STAGE: December 25, 2010
    JOURNAL FREE ACCESS
    The impact strength of lead-free solder joints in a Ball Grid Array (BGA) package was evaluated using the impact-bending test, and the effect of the strain and the strain pulse duration in the Printed Wiring Board (PWB) on the impact strength was studied. The impact strength of the solder joint strongly depends on the maximum strain and the strain pulse duration in the PWB. The failure mode of lead-free solder joints differed with the fracture lifetime. When the fracture lifetime was short, the crack propagated completely within the intermetallic compound region. On the other hand, when the fracture lifetime was long, the crack initiated in the bulk solder region and propagated into the intermetallic compound region. These failure modes depend on the maximum strain and the strain pulse duration in the PWB.
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  • Hiroyuki Kadota, Ryuichi Kanno, Masahiko Ito, Jin Onuki
    Article type: Technical Papers
    2010Volume 13Issue 3 Pages 213-219
    Published: May 01, 2010
    Released on J-STAGE: December 25, 2010
    JOURNAL FREE ACCESS
    We have developed a new plating process, which shortens the plating time by about 60% as compared with that of conventional through-electrode forming processes for three-dimensional mounting technologies. Using the new plating system, we have succeeded in the complete filling of 10 μm diameter Cu through-electrodes with an aspect ratio of 7.0. The microstructures and electrical characteristics of the Cu films formed by the new high-speed plating process were found to be at the same level as those formed by conventional plating.
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