金属表面技術
Online ISSN : 1884-3395
Print ISSN : 0026-0614
ISSN-L : 0026-0614
33 巻, 4 号
選択された号の論文の6件中1~6を表示しています
  • 江口 晴一郎, 横井 昌幸
    1982 年 33 巻 4 号 p. 136-139
    発行日: 1982/04/01
    公開日: 2009/10/30
    ジャーナル フリー
    The cathodic current efficiency for chromium deposition from oxalic acid baths containing, chromic acid and ammonium sulphate, has been examined over a wide range of bath compositions and plating conditions. High current efficiencies were obtained in baths containing 100g/l total chromium, 48g/l hexavalent chromium, 75g/l (NH4)2SO4. The current efficiency increased with decreasing current density and bath pH, and with increasing bath temperature. At the best current efficiencies, however, bright chromium deposits were not obtained, and to obtain bright chromium deposits, hexavalent chromium concentration should be 12-38g/l.
  • 六水塩-n-プロパノール浴からのクロムの電析
    津留 壽昭, 小林 繁夫, 藤山 純一, 乾 忠孝
    1982 年 33 巻 4 号 p. 140-145
    発行日: 1982/04/01
    公開日: 2009/10/30
    ジャーナル フリー
    Optimum bath compositions and plating conditions were experimentally sought for obtaining bright chromium deposits from CrCl3⋅6H2O-n-propanol baths containing cationic and anionic surfactants and the effects of addition of the surfactants on the cathode current efficiency were studied. The appearance of bright and adherent deposits was affected by plating time, bath temperature and applied current density. For promising chromium deposition, cationic and anionic surfactants had the effectiveness in the following order
    (C2H5)4NCl≈(C2H5)4NBr≥n-C12H25 SO3Na(DBS)≈n-C15H31COONa(SP).
    Mirror bright deposits of chromium were obtained from the bath consisting of CrCl3⋅6H2O 100g/l and surfactants 5.0g/l at 15-25mA/cm2, 30°C and 3-10min, plating time interval. The highest current efficiency of 50% was obtained in a chromium plating bath of CrCl3⋅6H2O 100g/l and DBS as the additive at 25mA/cm2, 30°C and 3min, plating time interval. X-ray diffraction analysis showed that the preferred orientation of the Cr deposits was strong in (210) plane. In the case of the addition of (C2H5)4 NCl and DBS the mean lattice constant and grain size of the deposits were found to be 4.57-4.58Å and ca. 85-100Å, respectively. The thickness of the deposit as plated was about 0.5-max. 3.6μm.
  • 水本 省三, 縄舟 秀美, 川崎 元雄
    1982 年 33 巻 4 号 p. 146-151
    発行日: 1982/04/01
    公開日: 2009/10/30
    ジャーナル フリー
    Bulk plating of nickel from Watts bath has been studied using a box type vibratory barrel. Effects of cell current and vibrating condition on the electric contact between collector electrode and specimens, the spread of the deposit thickness and on the fluid state of specimens were investigated. The mixing rate of fluidized specimens increased with increasing frequency and amplitude of the cell. On and off-time for the electric contact between collector electrode and fluidized specimens were observed periodically the same to the vibration frequency of the cell. When the cell current and the amplitude are big, collector electrode tends to be passivated increasing individual difference in the deposit thickness. The spread of the deposit thickness could be contracted to about 3% in relative standard deviation under suitable conditions.
  • 百瀬 治, 内田 荘祐
    1982 年 33 巻 4 号 p. 152-155
    発行日: 1982/04/01
    公開日: 2009/10/30
    ジャーナル フリー
    The gas sulfunitriding of steel in CS2 added atmospher was investigated. A test piece of S 45 C steel was treated in an atmospher of 50% NH3 and 0.006% CS2 added to propan converted carrier gas at temperature of 843K for 10.8ks. It was confirmed by X-ray diffraction that the surface products were Fe1-xS, FeS, Fe3N and Fe4N respectively. The compound layer was observed on the cross sectional microstructure of treated specimen. The hardness gradualy increases toward the inner layer and reached maximum value. From those results the gas sulfunitriding of steel was possible used a CS2 added atmospher.
  • 海老原 健, 高橋 英明, 永山 政一
    1982 年 33 巻 4 号 p. 156-164
    発行日: 1982/04/01
    公開日: 2009/10/30
    ジャーナル フリー
    Electropolished 99.99% Al foil coupons were anodized in H2SO4 solutions of 0.5-4.0mol·dm-3 at 10-40°C, by applying a constant current in a range of 0.5-50mA·cm-2, Morphology of the oxide films was examined using electronmicroscopic and electrochemical techniques. For the accurate estimation of the number of pores, N, from electronmicrographs, the pores were widened by chemical dissolution of the oxide in a H2SO4 solution before the film was stripped from the substrate metal. The total film thickness, h, was estimated from the sections of films under a scanning electronmicroscope, and the pore radius, r, was calculated from the porosity of the oxide, α(=Nπr2), measured by the pore-filling method proposed by Middelhoek. The estimation of the barrier layer thickness, δb, was made according to Hunter's principle by measureing the voltage jump, Ej, when applying a small anodic current in a neutral borate solution. The thickness/voltage ratio, δb/Ej, was determined from the time-variations in the pore-wall thickness, δp, and Ej during chemical dissolution of the oxide, on an assumption that δb and δp thin at equal rates. In agreement with the results reported previously, N decreases and r and δb increase as the anodizing voltage, Ea, increases, but the results of this investigation clearly show that these quantities are solely the function of Ea although Ea is strongly affected by the solution condition and anodizing c.d. It is demonstrated that δb/Ea ratio is not constant but decreases with increasing Ea. For films formed with a fixed number of coulombs, the value of h somewhat increases with increasing Ea, solution concentration and temperature. The density of oxide ρ, is estimated to be 3.0-3.5 by dividing the weight of the film by the oxide volume calculated from the values of h, N, r and the chemical dissolution rate of the pore-wall during anodizing. It is interesting to note that ρ decreases with increasing Ea, solution concentration and temperature. The significance of the techniques of determining the quantities describing the film structure is discussed.
  • 三田 郁夫, 宮澤 幸一
    1982 年 33 巻 4 号 p. 165-171
    発行日: 1982/04/01
    公開日: 2009/10/30
    ジャーナル フリー
    The pulse wave was synthesized by chopping of the d. c. constant voltage source using a microcomputer and a power transistor. Anodic oxidation of aluminum was performed by these synthesized pulse wave. The current waveform of anodic oxidation was classified into three types according to the shape and the number of inflections: the type B by which a barrier layer was formed, the type P by which a porous film was formed and the type D by which the anode was dissolved. The current waveform, observed when anodic oxidation of aluminum was performed in a electrolyte of 0.05M borax added to 0.5M boric acid or of 9.08M phosphoric acid, was influenced by the temperature of the electrolyte and the anodizing time. It was evident that the barrier layer of the phosphoric acid film was chemically dissolved when the OFF time of the pulse wave was changed from 25ms to 50 ms. No capacity current at the start of anodic oxidation in 1M sulfuric acid was observed even when the current waveform for each pulse every 25ms was stored in a wave memory. The Al3+ ions in 1M sulfuric acid were found to cause a major disturbance in the leading edge of the capacity current. The similar phenomenon also appeared when stirring of the electrolyte was stopped.
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