TiN
x films with N/Ti atomic ratios of 0.99/1-0.56/1 were prepared by RF ion plating, and the phase, color and oxidation behavior in air of these films were investigated. X-ray diffraction showed film structures with N/Ti ratios in the 0.99/1-0.79/1 range were TiN(δ) single phase, and those with ratios in the 0.72/1-0.56/1 range consisted of TiN(δ) and Ti
2N(γ). The color of the TiN
x films varied from reddish gold for an N/Ti ratio of nearly 1/1 to pale yellow for a ratio of 0.6/1. For films with an N/Ti ratio of nearly 1/1, oxidation proceeded quickly at about 800°C, resulting in TiO
2. At lower N/Ti ratios, oxidation of the films proceeded at lower temperature, but at elevated temperature, the rate of oxidation decreased. These results show there is a significant difference in the oxidation behavior of TiN
x films depending on the N/Ti ratio.
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