真空
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
22 巻, 6 号
選択された号の論文の5件中1~5を表示しています
  • 溝淵 明
    1979 年 22 巻 6 号 p. 213-219
    発行日: 1979/06/20
    公開日: 2009/09/04
    ジャーナル フリー
  • 柿林 博司, 毛利 衛, 渡辺 国昭, 山科 俊郎
    1979 年 22 巻 6 号 p. 220-227
    発行日: 1979/06/20
    公開日: 2009/09/04
    ジャーナル フリー
    The growth process of the altered layer during ion-bombardment was investigated for Cu-Ni alloys at various temperatures by means of simultaneous SIMS and AES measurements. In the latter, both a lower energy Auger spectrum (LEAES) and a higher energy Auger spectrum (HEAES) were measured to elucidate the surface composition of several atomic layers. The initial surface compositions and their changing processes during the ionbombardment differed one another among the SIMS, LEAES and HEAES data for the same sample. Based on the difference in the sampling depth of SIMS, LEAES and HEAES, the in-depth profile of the altered layer was estimated. The changing process of the surface composition was found to vary remarkably with sample temperatures. This fact indicates that diffusion phenomenon plays an important role for the growth process of the altered layer. It was also found that excess defects produced by the ion-bombardment played a predominant role for the diffusion at lower temperatures, while defects in thermodynamical equilibrium predominantly took part in the diffusion at higher temperatures. Taking the thermodynamical surface segregation into consideration, the growth process of the altered layer could be simulated and it was found that the simulated results agreed fairly well with the experimental data.
  • 加藤 茂樹, 毛利 衛, 渡辺 国昭, 山科 俊郎
    1979 年 22 巻 6 号 p. 228-234
    発行日: 1979/06/20
    公開日: 2009/09/04
    ジャーナル フリー
    A combined system of microbalance and ion gun was designed and constructed to measure absolute sputtering yield with high accuracy. The small-sized ion gun with Einzel lens operated with electron impact ionization source was directly connected to the ultrahigh vacuum microbalance system with a sensitivity of 4 × 10-7 g/div. The measurement of sputtering yield could be performed in a remarkably short time using high current density of argon ions up to 0.5 mA/cm2at a pressure of 6 × 10-2 Pa. The sputtering yields of polycrystalline gold foil with low energy argon ions (360-1210 eV) were obtained with an accuracy of ±8% by weight loss of 10-100 μg within one hour for each measurement. The capability of this new combined system was examined and evaluated from various aspects.
  • 後藤 敬典, 石川 和雄
    1979 年 22 巻 6 号 p. 235-246
    発行日: 1979/06/20
    公開日: 2009/09/04
    ジャーナル フリー
    A designing and the construction of high speed pico-ammeter (HSPA) with feedback resistors (Rf) of 1011 and 1012Ω is described. The floating capacitance at the input and the distributed capacitance around the Rfcould be effectively compensated by using a guard method and compensating metal plates (4 pieces), respectively. The metal plates method is also capable of compensation for the non-uniformly distributed resistance of the Rf. Electronical circuits to reduce the Miller integration effect and to compensate the distributed capacitance by using a lag net-work were also employed. The characteristics of the HSPA was examined with use of square-waved electron emission current, and then the input capacitance including the input cable was about 70 pF. The rise times obtained were 0.4 and 0.7 ms for the Rf of 1011Ω for small and large (2/3full scale) signals, respectively. Those of 2.6 ms for the Rf of 1012Ω for large signal was also obtained. The noise characteristics and the use of MOS-FET associated with its protection techniques are also discussed.
  • 1979 年 22 巻 6 号 p. 251
    発行日: 1979年
    公開日: 2010/01/22
    ジャーナル フリー
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