巻号一覧
32 巻, 12 号
選択された号の論文の6件中1～6を表示しています
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仲秋 勇, 斎藤 順雄, 田中 孝彦, 吉田 和敏1989 年 32 巻 12 号 p. 839-844
発行日: 1989/12/20
公開日: 2009/10/20
ジャーナル フリーSubstrate temperature dependence of a-SiC:H films prepared by r.f. glow discharge decomposition of a methanesilane gas mixture diluted with helium has been investigated. A phenomenon which shows a peak accompanying a negative temperature coefficient in the measurement of temperature dependence on dark d.c. conductivity has been observed. This phenomenon appears for the films prepared at low substrate temperatures (100°C), with high methane gas flow rate ratios (CH4/SiH410/1) and with high r.f. powers (160W). The conductivity peak associated with the negative coefficient appears at about 170°C, which is independent of the deposition conditions. The hydrogen concentration in these films is found to be different from the estimated value. The correlation between the hydrogen concentration and optical properties of the films suggests that this phenomenon correlates with the film morphology. The results indicate that this phenomenon is related to the relaxation process of the films; the annealing attributed to the conductivity measurement is likely to relax the disorder caused by the deposition described above.抄録全体を表示PDF形式でダウンロード (805K) -
前山 智, 川村 朋晃, 尾嶋 正治, 竹中 久貴, 石井 芳一1989 年 32 巻 12 号 p. 845-850
発行日: 1989/12/20
公開日: 2009/10/20
ジャーナル フリーA multilayer consisting of six layer pairs of C (113.5 Å) and W (25 Å) has been designed and fabricated by sputtering method for a multilayer-coated mirror which was used as the first diffracting element of the Grating/Crystal Monochromator (GCM) installed at beam line 1A of the Photon Factory for soft X-ray monochromatization. Transmission function of GCM using the multilayer-coated mirror in combination with a grating (2400 g/mm) in the photon energy region 400-1000 eV has been evaluated by means of Au photocathode placed at the beam line end. The increase of monochromatized beam flux was observed at about 850 eV in the transmission function. A comparison between the obtained transmission function and the calculated reflectivity of the W/C multilayer demonstrates that this phenomena is caused by diffraction effect of the W/C multilayer.抄録全体を表示PDF形式でダウンロード (750K) -
加賀爪 明子, 上田 新次郎, 秋葉 政邦, 丸子 盛久1989 年 32 巻 12 号 p. 851-855
発行日: 1989/12/20
公開日: 2009/10/20
ジャーナル フリーSputtering system for semiconductor manufacturing need high vacuum condition. It takes long time to recover high vacuum after the chamber is opened to the air. In order to increase operating efficiency of the system, it is required to reduce the recovering time. So, in this study, glow discharge cleaning technique is applied using a glow-mode plasma source in argon gas. Discharge current distribution inside the sputtering system is measured ubder the various conditions. Following results are obtained form the test : It is proved that the lower pressure (here 3 × 10-3 Torr) and the higher anode currents or voltage are adopted, the more uniform distribution is obtained using two electrodes rather than one. By applying these results, the drastic reduction of pumping time is achieved. The pumping time to attain the pressure of 1.5 × 10-6 Torr is reduced to 6 hours by the 3.5 hours discharge cleaning although the conventional method needs 17 hours.抄録全体を表示PDF形式でダウンロード (607K) -
平井 実, 岩黒 弘明, 黒田 司1989 年 32 巻 12 号 p. 856-860
発行日: 1989/12/20
公開日: 2009/10/20
ジャーナル フリーX-ray photoelectron spectroscopy has been used to evaluate Si surfaces exposed to magnetron ion etching plasma in CCl2F2 gas. Plasma exposure of Si surfaces results in the deposition of a C, Cl, and F-containing film with the thickness of 10-13Å. It was found that the surface of the contamination film consisted of C-Cl-F bondings, and that the inside consisted of C-F bondings.抄録全体を表示PDF形式でダウンロード (571K) -
府山 盛明, 曽我 太佐男, 森尻 誠, 田村 克, 沢畠 守1989 年 32 巻 12 号 p. 861-868
発行日: 1989/12/20
公開日: 2010/01/30
ジャーナル フリーHigh density bonding technology with 320 soldered joints for switching LCD (Liquid Crystal Display) panels and ceramic substrates was investigated, where pitch of the bonding pad being 192 μm.
Controlled Flow Bonding (CFB) process was applied to the bonding of LCD panels. To minimize the bonding failures due to the difference in thermal expansion, flexible printed cable (FPC) was divided into 20 mm width subparts.
Adhesion strength of bonding joints was obtained to be 6 gf. After 500 cycles of thermal cycle test, adhesion strength decreased to 35% of the initial value. This, however, is considered not to cause any electrical problems because resistance of bonding joints was unchanged during this test.
A new CFB process for bonding FPC to warped ceramic substrates was proposed. By using magnets and a thin magnetic plate, we succeeded the solder bonding of FPC to warped ceramic substrates with warp up to 230 μm.抄録全体を表示PDF形式でダウンロード (1041K) -
宮地 賢一1989 年 32 巻 12 号 p. 869-874
発行日: 1989/12/20
公開日: 2009/10/20
ジャーナル フリーPDF形式でダウンロード (1293K)
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