巻号一覧
40 巻, 1 号
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塩川 善郎, 石橋 啓次, 細川 直吉1997 年 40 巻 1 号 p. 15-21
発行日: 1997/01/20
公開日: 2009/10/20
ジャーナル フリーThe dependence of resistivity on the oxygen flow rate in sputtered ITO films prepared by RF is quite different from that of ones prepared by DC. The minimum resistivity in RF-sputtered films is about half that in DC-sputtered films. The oxygen flow rate for minimum resistivity in RF-sputtered films is much lower than that in DC-sputtered films. However, these oxygen-doping mechanisms are still unclear.
In order to better understand these mechanisms, oxygen partial pressures under ITO sputtering were measured using a quadrupole mass analyzer with a differential pumping system. The data were interpreted using a quantitative analysis method.
The results reveal that 1) the ratio of gas-phase oxygen to all phases of oxygen coming from the ITO target is the same for DC and RF, 2) the total amounts of all phases of oxygen doped into films are the same in the optimum condition for minimum resistivity, 3) the absorption efficiency of oxygen gas is larger for RF-sputtered films and 4) the oxygen concentration in ITO films is one of the basic factors for determining the resistivity, however there should be other factors which determine the difference between the DC- and RF-sputtered films.抄録全体を表示PDF形式でダウンロード (945K) -
松本 皓永1997 年 40 巻 1 号 p. 22-27
発行日: 1997/01/20
公開日: 2009/10/20
ジャーナル フリーThe excitation and emission mechanisms of the photoluminescence in NbOx films prepared using reactive RF sputtering are discussed. Three peaks on the emission spectrum are observed at 2.1 eV, 2.4 eV and 2.8 eV in the visible region. As the 2.1 eV and 2.8 eV peaks agree with the peaks observed in the photoconduction spectrum, it is proposed that these emission peaks can be attributed to the transitions from the conduction band to the 2.1 eV and 2.8 eV levels lying lower than the conduction band. The peak corresponding to the 2.4 eV emission peak does not appear in the photoconduction spectrum; therefore, this emission may be caused by the transition between the 0.35 eV and 2.8 eV levels. As the intensity of the emission peaks decreases with the heat treatment of the films in the oxygen atmosphere, it appears that these levels are caused by the vacancies in the oxygen atoms.抄録全体を表示PDF形式でダウンロード (806K) -
尾高 憲二1997 年 40 巻 1 号 p. 28-36
発行日: 1997/01/20
公開日: 2009/10/20
ジャーナル フリーThe influence of the amount of outgassing from a turbomolecular pump (TMP) on pumping speed was investigated experimentally. The amount of TMP outgassing was calculated using the results of experiments for measurement of outgassing from a stainless steel vessel. The calculation method is based on a new formulation for pressure estimation in which intrinsic pumping speed and the amount of TMP outgassing are considered. The amount of TMP outgassing was found to be much greater than that from the vessel, and the ratio of the two reaches more than twenty after baking, having being four before baking. This makes the ratio of the effective pumping speed to the nominal one about 0.03 after baking, and 0.2 before baking. These results clarify that the amount of TMP outgassing plays quite an important role in pressure determination in the vacuum system. The high accuracy of pressure estimation by the new method facilitated selection of the appropriate size of pump for a vacuum system. The new formulation can also be used for quantitative evaluation of the influence of materials, surface treatments, and configuration of the TMP on the pumping speed.抄録全体を表示PDF形式でダウンロード (1222K)
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