A compact type angular-resolved secondary ion mass spectrometry was newly developed. The angular distribution (AD) of secondary ions ejected by oblique Ar
+ sputtering at 62 degree from the normal to the surface was measured by a simple tilt operation of the sample stage under a special geometry of an ion gun, a sample stage and a detector. Using this system, AD of sputtered ions was measured for a HfN film sample. Ion intensities of Hf
+, N
+ and HfN
+ decreased monotonously with an increase in the ejection angle. AD of Hf
+ was identical with that of N
+, implying that preferential sputtering attributed to the difference in mass and surface binding energy played a dominant role in Ar
+ sputtering of HfN. Since the yield of HfN
+ dimer ions was almost independent of that of Hf
+ and N
+ monomer ions, it was concluded that the HfN
+ ions originated from a direct ejection process of clusters.
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