Following the technical developments in dyeing or finishing, abundant color environments have been formed in the apparel and other fields of living. Among them, it is noteworthy to notice that colors containing luminary are increasing adopted recently.
In this report, the color appearance in some polymeric thin-films without any colored substances such as dyes or pigments were examined. The color appearance in these thin-films is generated by the interference phenomena. A study has been made on the basis of following two standpoints: (i) examination of relation between the color appearance and the substrates surface morphologies, and (ii) investigation on the optimum spectral reflectance equation for thin-films on silicon wafer, which have an excellent chromatic effect.
The authors found that the color appearance in thin-films contains the regular reflective beam and decreases with the surface roughness of substrates. The discussion on the examination with the spectral reflectance curves of the thin-films on silicon wafer and some factors in the thin-film reflectance equation has revealed an optimum description for the experimental curves.

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In the previous study, a discussion has been made to evaluate the features of collected camouflage patterns from the view point of symmetry.
In this study, some random patterns were generated in order to use them as camouflage patterns. They were generated by applying an opposite-Sugeno integral filter to uniform random numbers, and their two types of symmetry, i.e., reversal and rotational symmetry were evaluated as compared with collected camouflage patterns and the standard geometric patterns.
By increasing the number of iteration times of the filtering, 13 sorts of random patterns were generated, and they were in order of fineness, i.e., from fine patterns to medium coarse patterns.
An overall symmetry of nine fine patterns out of the thirteen random patterns were superior to that of the camouflage and geometric patterns in the synthetic evaluation score. All of the random patterns were very good in rotational symmetry. However, the coarser the random pattern became, the worse the reversal symmetry was.

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