An electrodeposited tri-color filter for use in a full color LCDs was proposed in 1983. Since this color filter was deposited on finely patterned ITO electrodes, ITO etching process was inevitable and the manufacturing yield has become a issue. To solve this problem, a new electrodeposited tri-color filter was developed. This tri-color filter was electrodeposited on the ITO electrode which was masked with pigment-dispersed polymer black matrix and a positive photoresist. The black matrix consisted of photosensitive acrylic polymer and organic pigment mixture because carbon black had low electrical resistivity. Because a Photoresist No.87 which had high photosensitivity after thermosetting was adopted, second and third electrodeposition were carried out without additional positive photoresist coating process. Therefore, the coating process which reduced process-yield was just two times. Furthermore, the new process had other merits such as high through-put because electrodeposition speed was 10 sec/color. The electrodeposited tri-color filter for 10.4in.-Diagonal 512 Color TFT-LCDs was fabricated with 25.0% luminous transmission efficiency and 57.4% NTSC gamut.