Barrier electrode plasma display panels with cell pitch of 0.5 mm are fabricated. We investigate the effect on optical characteristics due to size of sell pitch. And we can obtain almost same value of luminance.
An impregnated cathode with a W coated-film containing Sc is capable of high current density operation at low temperature. Cathode fabrication has been investigated. The coated-film is prepared by RF co-sputtering using three independent targets consisting of W, WO_3 and Sc_2O_3. An optimum Sc/W weight ratio in the coated-film is from 0.029 to 0.036. A W cathode pellet with 28% porositey and impregnation at 1900℃ are desirable to realize good emission characterisics.
The newly developed 29 inch and 34 inch "Super Trinitron" CRT have adopted the flat-faced panel in order to reduce the geometric distortion of the image. The picture quality of this CRT has been improved remarkably by adopting the new electron gun with long focal lens and the "Neutral Black" silica coating.
Dynamic focus voltage for EA-DF lens electron gun is reduced 42 to 48%, without deteriorating beam spot characteristics, by adding one more quadrupole and three more dynamic focus lenses in the gun. Contrary to ordinal operation of conventional gun, quadrupole lens strength is maximized when the beam is not deflected.
We have developed a couple of high quality HD (Hivision) displays, 46-in. projection and 30V-in. direct view. The specifications of the displays are 800TV lines (horizontal resolution), 1370 cd/m^2 (46-in. projection), 720 cd/m^2 (32-in. direct view), etc.. We report on the technology to realize the displays.
A new HDTV projector using a-Si TFT LC panels with a record number of pixels for the industry-1.5million, has been developed. The new projector offers high resolution pictures with higher brightness and a superior contrast ratio thanks to the first liquid cooling system ever in an LC projector, a newly developed high-intensity lamp and projection lens, and optimal designs in reflection mirror shapes and dichroic mirror characteristics.
Reduction of pixel size of poly-Si TFT active matrix LCDs is discussed. To have hitgh aperture ratio, the area of storage capacitor is reduced by making dielectric film of storage capacitor thinner than that of TFT. LDD structure TFT is used for pixel TFTs to reduce off current. Using these techniques, test panels with 37μmx 32μm pixel pitch are fabricated. Drivers are fully integrated simultaneously on the substrate. Aperture ratio of 32%, and contrast ratio more than 50 : 1 are obtained.