Shinku

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To investigate the deviation of composition from the target to films deposited by RF sputtering, composition of Corning 7059 glass films deposited under several sputtering conditions has been measured using an Electron Microprobe Analyzer (EMA).
This glass is widely used for thin film substrates, and is composed of SiO₂, Al₂O₃, B₂O₃ and BaO.
The glass substrates were set at several positions in space between the cathode and anode in the sputtering chamber.
In the composition of the films deposited on the substrate, which was located just above the center of the cathode, the amounts of BaO and Al₂O₃increased by 5-10% after the deposition, while the amount of SiO₂ decreased by 10-15% and that of B₂O₃ remained unchanged.
The intensity of BaLαa and AlKα measured by EMA decreased exponentially with distance from the center of the anode, while that of SiKα increased exponentially and that of B remained unchanged.

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