Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
Volume 43, Issue 10
Displaying 1-11 of 11 articles from this issue
  • Application to Pumping of a Narrow Gap Between Large Plates
    Kenichi NANBU, Yasuo WATANABE, Shigeru YONEMURA
    2000 Volume 43 Issue 10 Pages 939-945
    Published: October 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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  • Hiroshi IMAGAWA
    2000 Volume 43 Issue 10 Pages 946-950
    Published: October 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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  • Chiharu MAEDA
    2000 Volume 43 Issue 10 Pages 951-955
    Published: October 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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  • Tadashi SAWADA, Wataru SUGIYAMA, Masuhisa YABUKI
    2000 Volume 43 Issue 10 Pages 956-961
    Published: October 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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  • Yoshihiro SATOH, Tomio KUBO, Izumi SAKAI, Yoshio SAITO
    2000 Volume 43 Issue 10 Pages 962-966
    Published: October 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
    A large amount of outgassing from the laminated cores in the pulse-operating magnets is one of the causes of pressure rise in an accelerator vacuum chamber. Outgassing rate measurements were carried out for a thousand of 0.1 mm thickness steel laminations, being stacked, in the compressed and uncompressed conditions. The measured rates of these samples did not show a significant difference, and indicated a t-1/2 time dependence. A pre-baking treatment for the laminated core samples was also examined.
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  • Masaya IWAKI
    2000 Volume 43 Issue 10 Pages 967-972
    Published: October 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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  • Takao SAWADA, Keiji WATANABE, Keiji FUKUYAMA, Takuya OHIRA, Masaru KIN ...
    2000 Volume 43 Issue 10 Pages 973-977
    Published: October 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
    MgO film is used in ac-PDPs (Plasma Display Panels), since it is stable and protective to a plasma and also has a high secondary electron emission. This study focused on oxygen partial pressure that is one of the parameters in electron beam evaporation. The results showed that higher oxygen partial pressure produces better crystallization. When the oxygen partial pressure is high, (111) orientation grows and the grain diameter increases. However, it was found that the density and the refractive index decreased and the gas adsorption amount increased. The increase may be due to the microstructure of MgO film, where adsorbed gas such as water is trapped between the bar-shaped crystals.
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  • Weakly-interacting Surfaces with Si Clusters : Si-Stabilized Graphite and SiC
    Hideyuki TANAKA, Toshihiko KANAYAMA
    2000 Volume 43 Issue 10 Pages 978-985
    Published: October 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
    We studied thermal desorption of Si clusters from graphite and SiC surfaces using quadrupole mass spectrometry and scanning tunneling microscopy (STM) in search of a substrate whose surface is inert to Si clusters. Although graphite was found to react with Si clusters, an inert surface was formed when Si vapor was sufficiently supplied to the graphite surface at 1500°C. This Si-stabilized graphite surface, from which Si clusters desorbed even at 400°C was considered to be composed of polycrystalline SiC. This observation led us to study interaction of Si clusters with single crystalline 6H-SiC (0001) surfaces. Thermal desorption spectroscopy showed that three types surfaces appeared when Si-deposited SiC was annealed. The most inactive one formed at>1500°C and the structure was identified as 6 √3× 6√3R30° by STM. The activation energy for desorption of Si, Si2, and Si3 from the surface was measured to be 46, 49, and 66 meV. These small values evidenced the physisorption of Si atoms and clusters on the surface.
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  • Akira KASAHARA, Young-Sung KIM, Masahiro TOSA, Kazuhiro YOSHIHARA
    2000 Volume 43 Issue 10 Pages 986-991
    Published: October 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
    Vacuum friction measurement system was developed in order to evaluate the sliding friction coefficient by changing load from 1.5 N to 0.98 mN, and changing pressure from 1×105 Pa to 1×10-8 Pa. The measurement was carried out on typical vacuum materials such as type 304 austenitic stainless steel which had been surface treated by chemical polishing, mechanical polishing, or electrochemical buffing. The measurement at the condition of the load less than 1 mN shows that surface adosrbate on the steels affects the friction force. However, the measurement at the condition of the pressure less 10-5 Pa shows that surface adosrbate does not affect the friction. The friction behavior in a vacuum seems to be affected by the vacuum environment.
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  • Hironori KUMAZAKI, Yoshihisa YAMADA, Seiki INABA, Kazuhiro HANE
    2000 Volume 43 Issue 10 Pages 992-995
    Published: October 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
    Micromachining of an optical fiber was carried out in CF4 plasma by reactive ion etching (RIE) system consisting of two parallel-plate electrodes and a rotary motion feedthrough. The cathode was powered by a rf generator at 13.56 MHz and was covered with a quartz plate in order to prevent sputtering of nonvolatile compounds from the cathode. During the etching, the rotation of the optical fiber could be controlled from outside the vacuum chamber. The diameter of the etched optical fiber was reduced from 125 pm to 50 pm by RIE for 8 hours under the condition of 13 Pa pressure and 150 W rf power. The other processes such as the sharpening of the fiber tip were also described.
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  • [in Japanese]
    2000 Volume 43 Issue 10 Pages 998-1001
    Published: October 20, 2000
    Released on J-STAGE: October 20, 2009
    JOURNAL FREE ACCESS
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