Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 34, Issue 2
Displaying 1-5 of 5 articles from this issue
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  • On-Line Electron Microscopy for Structural Analysis
    Koichi KANAYA
    1991 Volume 34 Issue 2 Pages 83-89
    Published: February 20, 1991
    Released on J-STAGE: January 30, 2010
    DOIhttps://doi.org/10.3131/jvsj.34.83
    JOURNAL FREE ACCESS
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    [in Japanese]
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  • Surface Analysis of TiN : Influence of Altered Layer due to Argon Ion Bombardment
    Katsumasa YABE, Okio NISHIMURA
    1991 Volume 34 Issue 2 Pages 90-94
    Published: February 20, 1991
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.34.90
    JOURNAL FREE ACCESS
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    Surface-altered layers of TiN irradiated with argon ions under various conditions of ion energy from 1.5 to 5 keV and incidence angle from 25° to 90° were studied by means of XPS. Some depression in the nitrogen content is caused by the irradiation. The extent of the depression increases nearly in proportion to the incidence angle and does not vary with ion energy. The depth profiles of nitrogen in the altered layers were simulated with deconvoluting angle-resolved XPS data based on a multiple layer model. As the incidence angle and/or ion energy becomes larger, the altered layer becomes thicker. At low incidence angle, some rise in the nitrogen content in the top surface is observed. From the results, it is seen that the Ar ion etching conditions of lower ion energy and smaller incidence angle are useful for avoiding significant influence from an altered alyer in in-depth analysis by XPS.
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  • Oxidation Properties of Various Graphites and Metal Mixed Graphites Under High Temperature Environment
    Masao HASHIBA, Kazuaki AKIMOTO, Tomoaki HINO, Toshiro YAMASHINA
    1991 Volume 34 Issue 2 Pages 95-100
    Published: February 20, 1991
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.34.95
    JOURNAL FREE ACCESS
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    The oxidation velocities of isotropic graphite, pyrolytic carbon, silicon- and boron-mixed graphites were measured by using a vaccum microbalance of Cahn RG-type under an oxygen pressure of 1.33 kPa (10 Torr) and a temperature range from 650 to 900°C. For isotropic graphites with different ash concentrations, it was observed that the oxidation velocity increased with higher ash concentration when the graphite temperature was below 750°C. The pyrolytic carbon had the oxidation velocity of approximately one order of magnitude smaller than that of the isotropic graphite. The oxidation velocity of silicon-mixed graphite linearly decreased with the increase of silicon concentration. In the case of the boron-mixed graphite, the oxidation was considerably suppressed by the boron content and the weight gain was observed due to the formation of B203 when the boron concentration exceeded 10%.
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  • Properties of Low Vollage Discharge in Vapor and Cr Film Deposited by its Discharge
    Masao NOMA, Nobuyuki TERAYAMA, Masami NAKASONE
    1991 Volume 34 Issue 2 Pages 101-106
    Published: February 20, 1991
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.34.101
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    Cr vapor evaporated by an EB-gun in high vacuum. It was found from the measurement results of discharge characteristics that the anode voltage (VA) dependence of discharge current (Id) is represented as Id∝ (VA)n with inflection points (VA=26, 47 V) at the VA to the 3rd and 4th ionization potentials of Cr. It can be assumed that the character of the charged particles changes the inflection points. These studies have been developed for the properties of Cr films deposited on various VA on 7059 glass and Si substrates. The relations to VA of the crystal orientation, electrical properties and optical reflection of the visible region of Cr films have been discussed.
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  • Preparation and Characteristics of γ-Fe2O3 Magnetic Disks by Magnetron Sputtering Method
    Mitsumasa UMESAKI, Hirofumi OHUCHI, Hisatoshi HATA, Kaoru KAWATA, Kazu ...
    1991 Volume 34 Issue 2 Pages 107-112
    Published: February 20, 1991
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.34.107
    JOURNAL FREE ACCESS
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    Thin films of γ-Fe2O3 have been studied for application in high-density magnetic recording media because of their superior magnetic properties, wear resistance and chemical stability. Several processes were proposed for the fabrication of the γ-Fe2O3. We have been investigating the γ-Fe2O3 films preparation process consisting of Fe3O4 film deposition and heat treatment. Fe3O4 film were deposited by the reactive RF magnetron sputtering of an iron tatget in Ar+ O2 atmosphere and then transformed into γ-Fe2O3 films by the oxidation heat treatment. We report on the high rate of deposition of Fe3O4 films by magnetron sputtering. The deposition rate of Fe3O4 film by magnetron sputtering was about five times higher than that by diode sputtering. Fe3O4 films were transformed into γ-Fe2O3 films by heat treatment in air. The magnetic properties of γ-Fe2O3 films obtained in the above experiment were as good as those by the diode sputtering method.
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