Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 10, Issue 12
Displaying 1-3 of 3 articles from this issue
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  • Mass Transfer under Low Pressure
    Yuji KAWAMURA, Hiroshi MAKIHARA
    1967 Volume 10 Issue 12 Pages 419-428
    Published: December 20, 1967
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.10.419
    JOURNAL FREE ACCESS
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  • Interface Properties of MOS Structures Prepared by Reactive Sputtering
    Toyoki TAKEMOTO, Takashi ISHIHARA, Yasuaki TERUI, Kenji AKIYAMA
    1967 Volume 10 Issue 12 Pages 429-436
    Published: December 20, 1967
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.10.429
    JOURNAL FREE ACCESS
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    It is the purpose of this investigation to develop the techniques of depositing SiO2, Ta2O5 films on silicon by reactive sputtering. The infrared absorption, the refractive indexes, the dielectric constants, the dielectric breakdown strengths and ultraviolet absorptions of these films indicate that the oxides may be considered as stoichiometric SiO2, Ta2O5. The interface properties of these systems are evaluated mostly by the C-V curves of MOS diodes. The surface state charge density of 120 × 1011/cm2 is measured, they can be decreased by selecting the discharge conditions to minimize the bombardment effects of ions and electrons. C-V curves of MOS diodes with large surface states show frequency dependence. Frequency dependences of these elements are examined experimentally and theoretically. The qualitative agreement between the theoretical and experimental C-V curve is obtained. But these surface states produced by sputtering can be decreased by heat treatments above 700°C.
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  • An Application of Quadrupole Mass Filter to the Study on Catalytic Reactions
    Toshiro YAMASHINA, Atsushi FUJINAGA, Takao HANASAKA
    1967 Volume 10 Issue 12 Pages 437-444
    Published: December 20, 1967
    Released on J-STAGE: January 28, 2010
    DOIhttps://doi.org/10.3131/jvsj.10.437
    JOURNAL FREE ACCESS
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    Performance of a quadrupole mass filter constructed under the suggestion of Paul et al is described with the main object of an application to the study on chemical reactions. With the mass filter having four analysing rods of 8 mmφ × 100mm, gases and vapors with the mass range 1 to 300 and in the pressure range of 10-4 torr to the ultra high vacuum can be analysed in scanning rate of 10-3 to 20 sec/AMU. The mass filter spectra of several organic gases were compared with the standard spectra, the both being found to be nearly same in the cases of gases of mass number less than about sixty. Using the catalytic reaction apparatus connected to the mass filter, a study on flash desorption of the adsorbed layer of iso-propyl alcohol on nickel oxide was carried out. Very small amounts of the desorbed gases such as acetone, propylene, carbon dioxide and so on, could be detected for a few minutes. Discussion was made on the mechanism of catalytic decomposition of iso-propyl alcohol, and it was pointed out that the use of mass filter could be very successful as a monitor of chemical reactions.
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