Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 24, Issue 6
Displaying 1-6 of 6 articles from this issue
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  • Development on Metal Hollow O-Ring “Sureket” for Ultra High Vacuum
    Takahiro KUGO
    1981 Volume 24 Issue 6 Pages 341-345
    Published: June 20, 1981
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.24.341
    JOURNAL FREE ACCESS
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  • Experiment of Discharge Cleaning by Electron Cyclotron Resonance Plasma in JFT-2 Tokamak
    Yuichi SAKAMOTO, Yukio ISHIBE, Katsuki YANO, Kiyohiko OKAZAKI, Hitoshi ...
    1981 Volume 24 Issue 6 Pages 346-352
    Published: June 20, 1981
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.24.346
    JOURNAL FREE ACCESS
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    Adischarge cleaning experiment was carried out in JFT-2 Tokamak by using a low electron temperature plasma of hydrogen produced by electron cyclotron resonance (ECR) discharge. By the use of 2.45 GHz, 2 kW cw microwave. The electron temperature and density of the plasma were typically 4 eV and 1.2 x 1010 cm-3 respectively. Under quasi-equilibrium condition, comparison between the ECR discharge cleaning and the Taylor discharge cleaning (TDC) was done by observing the partial pressures of CH4, H2O and CO gases. The TDC was carried out with a plasma with electron temperature of 4.1 eV and density of 3.5 x 1012 cm-3, produced with a pulse width of 10 ms and a repetition frequency of 0.67 Hz. Both cleaning methods were found to have the approximately equal cleaning effect. This shows the applicability of the ECR-DC to advanced Tokamaks.
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  • New Type Ionization Gauge for UHV (I)
    Fumio WATANABE
    1981 Volume 24 Issue 6 Pages 353-359
    Published: June 20, 1981
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.24.353
    JOURNAL FREE ACCESS
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    The design and performance of a new type of ionization gauge, specifically developed for an accelerator, equipped with an ionsource constructed in combination of three electrodes (a hemisphere mesh anode, an annular filament and a funnel-shaped electron reflector) is described. In order to improve the signal-to-noise ratio, the ion current is converted into an alternating current signal by a modulator grid located beneath the ion outlet of the ion source. The new gauge has a sensitivity factor for nitrogen of 14 Torr-1 and a modulation factor of 1.00.
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  • Reactive Sputtering of Iron in Mixed Argon-Oxygen Atmospheres
    Yoshikazu ISHII, Seizi HATTORI, Satoshi OHTA
    1981 Volume 24 Issue 6 Pages 360-369
    Published: June 20, 1981
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.24.360
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    R. F. reactive sputtering of iron in mixed argon-oxygen atmospheres has been investigated by means of measurements of deposition rate, electrical resistivity, and X-ray and electron diffraction. Thin films of iron oxides were deposited on glass, alumite, and (001) NaCl substrate, while changing the oxygen partial pressure from 2 × 10-4 to 5 × 10-2 Torr at a total pressure of 1.5 × 10 -2 Torr.
    A hysteresis of the deposition rate was found in an increasing and decreasing cycle of the oxygen partial pressure. This phenomenon was explained by a model based on the relative relation between the sputtering rate and the oxidation rate of an iron target surface. Hence, two stationary reactive sputtering states were found to exist between certain critical values p* and p**, where the depositon rate changed drastically. One was a high deposition rate, the other was a low one, associated with a clean iron target and an'oxidized one, respectively. In the former state, Fe3O4 single phase films were obtained by controlling the deposition rate. Properties such as lattice constant, microstructure, and orientation of the deposited Fe3O4 films formed at various oxidation degrees were also examined.
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  • The Multipactor Ion Pump for Ultra High Vacuum
    Kuniyoshi YOKOO, Shoichi ONO
    1981 Volume 24 Issue 6 Pages 370-376
    Published: June 20, 1981
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.24.370
    JOURNAL FREE ACCESS
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    A new type of high-speed ion pump using a multipactor cathode is proposed and the results, obtained in our experiments of the pump which was manufactured by way of the first trial, are described. The multipactor cathode has excellent characteristics for such a use, as follows; 1) it does not contaminate vacuum condition, because it is a cold cathode made of some pure metal, as like as Al. 2) electron emission density is considerably high. 3) ionization rate of supplied electrons can be increased largely compared with any other electron supply method. 4) supply of electrons into a considerably wide area is quite easy.
    We could confirm an advantageous characteristic of the pump, that is, the maximum pump current per unit volume reached up to 30 times as much as that of a usual ion pump in vacuum conditions of less than 10 -4 Pa.
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  • Erratum
    1981 Volume 24 Issue 6 Pages 397
    Published: 1981
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.24.6_397
    JOURNAL FREE ACCESS
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