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Volume 44, Issue 9
Displaying 1-8 of 8 articles from this issue
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Naoki MIZUTANI, Toshio HAYASHI2001 Volume 44 Issue 9 Pages 788-794
Published: September 20, 2001
Released on J-STAGE: October 20, 2009
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Takeshi IKEDA, Yoshinori HATANAKA2001 Volume 44 Issue 9 Pages 795-801
Published: September 20, 2001
Released on J-STAGE: October 20, 2009
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Seigou TAKASHIMA, Masaru HORI, Toshio GOTO2001 Volume 44 Issue 9 Pages 802-807
Published: September 20, 2001
Released on J-STAGE: October 20, 2009
JOURNAL FREE ACCESSWe have developed a measurement technique for absolute hydrogen (H) atom densities in process plasmas using a vacuum ultraviolet absorption spectroscopy (VUVAS) technique employing a high-pressure microdischarge hollow cathode lamp (MHCL) as a Lyman α (Lα, 121.6 nm) emission light source. The characterization of the Lα emission line profile could be simplified by using a high-pressure discharge at about 1 atmosphere. In order to evaluate the absolute H atom density, the estimation of the self-absorption and the emission line profile of the MHCL have been carried out. Using the VUVAS technique with the MHCL, the absolute density of H atoms was measured in inductively coupled hydrogen molecule plasmas. The H atom density increased from 1.4 × 1011 cm-3 to 1.2 × 1012 cm-3 with increasing the pressures from 1.33 Pa to 66.5 Pa at a power of 100 W.View full abstractDownload PDF (844K) -
Sadao KADOKURA2001 Volume 44 Issue 9 Pages 808-814
Published: September 20, 2001
Released on J-STAGE: October 20, 2009
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Shigeharu TAMURA, Masato YASUMOTO, Nagao KAMIJO, Yoshio SUZUKI, Mitsuh ...2001 Volume 44 Issue 9 Pages 815-821
Published: September 20, 2001
Released on J-STAGE: January 29, 2010
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Haruo NAGAHAMA2001 Volume 44 Issue 9 Pages 822-830
Published: September 20, 2001
Released on J-STAGE: October 20, 2009
JOURNAL FREE ACCESSIn a inductively or capacitively coupled radio frequency discharge by a single frequency, the transition voltage Vc or power Pc from glow to arc discharge depends on the gas pressure p. When superposing two applied fields with different frequencies at the same time, if Vc decreases comparing with the value of single-frequency discharge, r.f. discharge plasma with high ionization state can be easily generated.
In a medium vacuum capacitively coupled r.f. discharge, effects of superposing two applied fields with different frequencies, that is, 2 MHz and 13.5 MHz have been studied. As a result, Vc of 2 MHz side has decreased by the superposed effects in the low pressure region (ω>ν), but Vc has not decreased in the high pressure region (ω<ν). Variations of Pc by the superposed effects in the discharge space of 13.5 MHz side have not been able to observe in all pressure region.View full abstractDownload PDF (1817K) -
Keisuke TAJIRI, Zensaburo KABEYA, Yosio SAITO2001 Volume 44 Issue 9 Pages 831-836
Published: September 20, 2001
Released on J-STAGE: October 20, 2009
JOURNAL FREE ACCESSA new copper electroforming is compared with conventional electroformings which have been applied for vacuum components. The new copper electroforming characterized by the use of electrolyte which contains no organic additives and by periodic reverse electrolysis is called PR process.
The pure copper deposit obtained from the PR process shows better performance than the deposits by conventional processes for electrical resistivity (IACS), thermal stability and electrical break down at high vacuum.
And unlike the conventional processes, the PR process has excellent bath stability needed to keep deposit's quality constant. Also, the PR process is quite suitable for complex configuration components as the conventional pyrophosphate process.View full abstractDownload PDF (1870K) -
[in Japanese]2001 Volume 44 Issue 9 Pages 837-841
Published: September 20, 2001
Released on J-STAGE: October 20, 2009
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