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Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 30, Issue 7
Displaying 1-4 of 4 articles from this issue
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  • Microstructure Control of CVD-Ceramic Film
    Toshio HIRAI, Hisanori YAMANE
    1987 Volume 30 Issue 7 Pages 559-605
    Published: July 20, 1987
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.30.559
    JOURNAL FREE ACCESS
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  • Hard Ceramic Film Preparation by Laser PVD
    Shinei MINETA, Nobuo YASUNAGA, Mamoru KOHATA, Yasuharu HAKAMAZUKA, Mas ...
    1987 Volume 30 Issue 7 Pages 606-612
    Published: July 20, 1987
    Released on J-STAGE: January 30, 2010
    DOIhttps://doi.org/10.3131/jvsj.30.606
    JOURNAL FREE ACCESS
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    A new ceramic coating technique was developed using high power CO2 laser (1001000 W) as an evaporating heat source. Coating experiment of various oxide and nitride ceramics onto metal substrates revealed that homogeneous hard films of amorphous structure could be prepared with high deposition rates (for example, in the case of mullite film, 0.6, μm/min at 320 W). It should be noticed that BN film formed by the laser deposition with the source of soft hBN ceramics showed very high hardness over Hk4000 kg/mm2. By simultanious irradiation of N ions generated through Kaufman type ion source nearly stoichiometric boron nitride films, can be formed which are considered to have a cubic structure.
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  • Stress in Thin Tantalum Films Deposited by Magnetron Sputtering
    Tohru TAKEUCHI, Isao YOSHIOKA, Katsuhiro FUJINO
    1987 Volume 30 Issue 7 Pages 613-618
    Published: July 20, 1987
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.30.613
    JOURNAL FREE ACCESS
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    Tantalum films sputtered in argon are in β-phase with (002) planes strongly oriented parallel to the substrate. The deviation from the standard (002) spacing is reversely proportional to the film stress, and the (002) spacing is proportional to the argon concentration in the films which is determined by the argon pressure in the sputtering vessel (the higher the pressure the lower the concentration).
    When the argon concentration is higher/lower than 2, 800 ppm the film shows compressive/tensile stress. The tensile stress can relax with the generation of microcracks.
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  • A Stepping Motor for Ultra High Vacuum
    Isao KUSUNOKI, Junichi MURAKAMI, Yoshiyuki TERUI, Takashi KOBAYASHI, H ...
    1987 Volume 30 Issue 7 Pages 619-623
    Published: July 20, 1987
    Released on J-STAGE: October 20, 2009
    DOIhttps://doi.org/10.3131/jvsj.30.619
    JOURNAL FREE ACCESS
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    A new stepping motor which has been developed for use in UHV. It was equipped with dry bearings for vacuum and bakeable up to 200°C. The performance of the motor was examined in UHV apparatuses. After a few days' pumping and baking, out gas from the motor in holding condition was negligible in UHV. The residual gas was analyzed by a mass filter, and normal species in UHV, i.e. H2, CH4, H2O, CO, CO2, and hydrocabons, were found. In operating condition rising of the pressure was observed to be proportional to the pulse rate (revolution rate). The dominant components of the out gas were H2O, CO, and CO2. Increasing rate of the temperature during the operation was small for the low pulse rate up to 500 pps, and the temperature was kept under 200°C for long operation.
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