Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
Volume 5, Issue 9
Displaying 1-6 of 6 articles from this issue
  • Tadatoshi OGURA
    1962 Volume 5 Issue 9 Pages 347-358
    Published: September 20, 1962
    Released on J-STAGE: September 29, 2009
    JOURNAL FREE ACCESS
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  • Kazumasa ONO
    1962 Volume 5 Issue 9 Pages 359-366
    Published: September 20, 1962
    Released on J-STAGE: January 28, 2010
    JOURNAL FREE ACCESS
    By the cooperation with the members of Hitachi Central Laboratory, we have recently succeeded in the manufacture of the Electron Beam Machining Equipment for the fine working of semi-conductors or metals etc. The instrument consists of an electron-optic system, working chamber and vacuum system, which operates under the working pressure of the order of 10-5 mmHg. This is able to heat and welt a specimen locally by the bombardment of finely focused electron beam. The groove cut with the electron beam is approximately 5μ in width.
    Performances :
    Accelerating voltage……020kV, 40kV, 60kV, 80kV, 100kV
    Beam current……1mA (max)
    Viewing system……An optical microscope with max. magnification 160X.
    Movable area of working table Inclination 45°, Rotation 360°, X-direction 20mm, Y-direction 20mm.
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  • Hikaru ARATA, Zenjiro ODA
    1962 Volume 5 Issue 9 Pages 367-370
    Published: September 20, 1962
    Released on J-STAGE: September 29, 2009
    JOURNAL FREE ACCESS
    An ultrahigh vacuum system which is composed of a Hickman type oil diffusion pump, a sorption pump and a non- refrigerated isolation trap using molecular sieve 13x as active material was tested. This combination has advantages of protecting the evacuation system from dangers by electricity failure. suspension of water-supply and of avoiding the trouble for a steady supply of refrigerant.
    The results obtained are summarized as follows.
    1) Amounts of air sorbed on molecular sieve 13x at 14°C and -183°C were about 2.5 l·μHg /g and 91446 l·μHg/g. respectively (at an apparent critical backing pressure=85μ) after bake -out at 400°C 26 for hours.
    2) Maintaining time of ultimate pressure depends on the activity of molecular sieve
    When a sorption pump with new molecular sieve was operated the system could be kept at an ultimate pressure below 5×10-9 mmHg for about 4 days. but with fairly used up one it was below 7×10-9mmHg for about 2 days.
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  • 1962 Volume 5 Issue 9 Pages 370
    Published: 1962
    Released on J-STAGE: September 29, 2009
    JOURNAL FREE ACCESS
    Download PDF (194K)
  • [in Japanese]
    1962 Volume 5 Issue 9 Pages 371-374
    Published: September 20, 1962
    Released on J-STAGE: September 29, 2009
    JOURNAL FREE ACCESS
    Download PDF (650K)
  • 1962 Volume 5 Issue 9 Pages 383
    Published: 1962
    Released on J-STAGE: September 29, 2009
    JOURNAL FREE ACCESS
    Download PDF (160K)
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