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Volume 32, Issue 1
Displaying 1-5 of 5 articles from this issue
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Kenjiro OBARA, Kazuyuki NAKAMURA, Yoshio MURAKAMI, Masamitsu NAGANUMA, ...1989 Volume 32 Issue 1 Pages 2-13
Published: January 20, 1989
Released on J-STAGE: October 20, 2009
JOURNAL FREE ACCESSPresent paper describes the performance characteristics of the knife-edge-type metal-seal flange. The aim of the study is to try to make efficient the combination function of flange. Parameters on improved flange are smaller than that of conventional flange as follows;
-number of bolt : 1/21/3, tightness torque : 3/5, flange thickness : 7/10.View full abstractDownload PDF (1324K) -
Daisuke INOUE, Shinichi TAKANO, Shuichi NOGAWA, Eisho OHSUGA, Eiji KAM ...1989 Volume 32 Issue 1 Pages 14-19
Published: January 20, 1989
Released on J-STAGE: October 20, 2009
JOURNAL FREE ACCESSSilicon nitride thin films deposited at room temperature by the method of reactive ion beam sputtering have been investigated. Silicon target was used for the film preparation with nitrogen ion beam generated in the magnetic multipole plasma source (bucket ion source). As increasing ion current, the deposition rate of the film became higher. However, we found no effects on the film composition or the optical characteristics. We used this silicon nitride thin film for the protective and the dielectric layer of magneto optical disk and the carrier to noise ratio of 48 dB was obtained.View full abstractDownload PDF (632K) -
Haruo NAGAHAMA, Teruo TAKAMOTO1989 Volume 32 Issue 1 Pages 20-25
Published: January 20, 1989
Released on J-STAGE: January 30, 2010
JOURNAL FREE ACCESSA inductively or capacitively coupled radio frequency discharge is being applied to the plasma CVD etc. The relations between r.f. power and electron density and temperatute, however, are not known in detail. A low pressure inductively coupled r.f. discharge generates two kinds of plasma states, that is, glow and arc plasma. The glow plasma generated at small r.f. power is weakly luminous, while the arc plasma at large r.f. power is intensly luminous. The authors have measured the radial distribution of electron density and temperature at two kinds of plasma states by the use of the double probes. It is found from the result that the electron density of the arc plasma is about 102 times higher than that of the glow plasma, on the contrary the electron temperatures of both plasmas are almost the same.View full abstractDownload PDF (877K) -
Yuichi SAKAMOTO, Kiyohiko OKAZAKI, Yousuke NAKASHIMA, Makoto ICHIMURA, ...1989 Volume 32 Issue 1 Pages 26-33
Published: January 20, 1989
Released on J-STAGE: October 20, 2009
JOURNAL FREE ACCESSECR discharge cleaning (ECR-DC) was carried out in GAMMA 10 tandem-mirror device of University of Tsukuba. By the use of microwave (2.45 GHz, 2 kW), a hydrogen cleaning plasma with the electron density and temperature of 2 ×1016 m-3 and 4.5 eV, respectively, was produced in a hydrogen pressure range of 210 × 10-5 Torr. The cleaning was conducted for 30 hrs. The effectiveness was examined by (1) residual gas analysis, (2) SAGE (surface analysis of adsorbed gas by electron impact outgassing), (3) Outgas measurement by ICRF (Ion Cyclotron Range of Frequency) pulse plasma, (4) electron density measurement, (5) relation between electron line density and diamagnetic signal of ICRF plasma, (6) optical spectroscopy and (7) electron temperature mesurement. The ECR-DC for 30 hrs accelerated the surface conditioning to the same level as that after 10001500-shots-ICRF pulsed discharge cleaning. This indicates that we can save about 23 weeks of wall surface conditioning after venting to air.View full abstractDownload PDF (894K) -
Hajime ISHIMARU, Yoshio SAITO1989 Volume 32 Issue 1 Pages 34-46
Published: January 20, 1989
Released on J-STAGE: October 20, 2009
JOURNAL FREE ACCESSDownload PDF (2829K)
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