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Volume 27, Issue 9
Displaying 1-5 of 5 articles from this issue
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Mitsuaki NISHIJIMA1984 Volume 27 Issue 9 Pages 695-704
Published: September 20, 1984
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSDownload PDF (1459K) -
Tetsuya HOSAKA1984 Volume 27 Issue 9 Pages 705-711
Published: September 20, 1984
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSThe propagation of tensile fatigue fracture of vacuum-evaporated gold films was observed in the scanning electron microscope by mounting the film on rubber substrate. Gold films from 580 to 810Å in thickness used in this study were heated at different temperatures ranging from 300 to 700°C. The fatigue tests were conducted at room temperature under tension-tension cycling using a strain range (0.3-0.6%), and a test frequency of one cycle per 2 seconds. The strain cycling was continued until distinct holes were observed in the film. Fatigue fracture was occurred by growth and coalescence of microholes within the plastic bands. Propagation of cracks in a linear array would be expected to induce total fracture only if resulting hole size approached the critical fracture width. The total cycles up to fracture (fatigue life) was usually of the order of 50 to 400 cycles.View full abstractDownload PDF (2301K) -
Akira KIKUCHI, Shigeru BABA, Akira KINBARA1984 Volume 27 Issue 9 Pages 712-717
Published: September 20, 1984
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSAdhesion of silver films vacuum deposited onto glass substrates was measured by the topple test machine developed in our laboratory. The substrates were exposed to glow discharge of air, oxygen, nitrogen, argon or hydrogen before deposition of films and the effects of exposure time to the adhesion were investigated.
The experimental results are summarized below :
1) The exposure of glass substrates to the glow discharge improves the adhesion.
2) The longer exposure time causes the stronger adhesion but no appreciable improvement in adhesion more than 60 sec.
3) While the samples were kept in air of 1 atm for 75 days, the adhesion strength increases with the elapse of time.
4) The variation of gas species in the glow discharge did not show any significant differences on the adhesion characteristics.View full abstractDownload PDF (640K) -
Isamu KATO, Shin-ji HARA, Katsumi EBASHI1984 Volume 27 Issue 9 Pages 718-723
Published: September 20, 1984
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSThe degree of dissociation of SiH4 gas in the microwave plasma CVD system has been obtained.
By means of attaching a glass pipe on the gas sampling orifice, it has been shown that the fragments from SiH4, SiHn (n=03), can be excluded and that only SiH4 molecules are extracted from a dissociated Ar/SiH4 mixture gas to the mass spectrometer. The degree of dissociation of SiH4 gas is evaluated from the ratio of the mass spectral line intensities that are measured with microwave discharges on and off. Using the glass pipes of different length, the degree of dissociation of SiH4 gas is measured at the different points of a chamber.
The degree of dissociation of SiH4 gas is from 40% to 70% and the radial distribution of it in the deposition chamber of this microwave plasma CVD system is very uniform.View full abstractDownload PDF (615K) -
Gen UEHARA, Kohta TAKAHASHI, Masakazu NAKANISHI, Ko HARA1984 Volume 27 Issue 9 Pages 724-727
Published: September 20, 1984
Released on J-STAGE: September 29, 2009
JOURNAL FREE ACCESSDownload PDF (393K)
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