Shinku
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 20, Issue 8
Displaying 1-3 of 3 articles from this issue
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  • Titanium Sublimation Pump
    Nobuharu OSAKO, Akira IWAMOTO
    1977 Volume 20 Issue 8 Pages 268-277
    Published: August 20, 1977
    Released on J-STAGE: September 04, 2009
    DOIhttps://doi.org/10.3131/jvsj.20.268
    JOURNAL FREE ACCESS
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  • Electron Microprobe Auger Spectrometer
    Tetsuo ISHIDA, Gensei SASAKI, Yoshitaka HAYASHI, Zenjiro ODA
    1977 Volume 20 Issue 8 Pages 278-288
    Published: August 20, 1977
    Released on J-STAGE: September 04, 2009
    DOIhttps://doi.org/10.3131/jvsj.20.278
    JOURNAL FREE ACCESS
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    The design and performance of a new Electron Microprobe Auger Spectrometer (EMAS) with the capability of UHV scanning electron microscope (SEM) is described.
    The incident electron beam from a W-hairpin cathode is focused by a magnetic lens system, and spatial resolution is below 0.5 μm for the Auger analysis mode and on the order of 100 Å in the SEM mode. The vacuum of the specimen chamber is kept at 10-9 Torr order during Auger analysis.
    Furthermore, an improvement of a spatial resolution is made to 700 Å by replacing W-hairpin cathode to a LaB6 cathode and introducing a pulse counter and signal processor in place of a conventional lock-in amplifier. Several examples of application are presented demonstrating the performance.
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  • A Cryostat for the Vacuum Deposition onto the Low- Temperature Substrate
    Taizo IMURA, Nobukazu ISHIHARA, Masakazu OKADA, Masaru KATOH
    1977 Volume 20 Issue 8 Pages 289-292
    Published: August 20, 1977
    Released on J-STAGE: September 04, 2009
    DOIhttps://doi.org/10.3131/jvsj.20.289
    JOURNAL FREE ACCESS
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    A cryostat available to prepare thin films onto the substrate cooled at liquid nitrogen temperature is devised. The cryostat consists of a copper substrate holder having a cavity to be filled with liquid nitrogen and a cylindrical column trap having five stage apertures. The substrate temperature can be set in the range between 100-573K by controlling either the flow rate of liquid nitrogen or the electric current of an inner heater. The thickness of deposited film is monitored by a quartz oscillator. Temperature dependence of resonance frequency of the crystal monitor is observed. Electron micrographs of 100 Å thick Ge and Cr films deposited at liquid nitrogen temperature show uniform amorphous structure.
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