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Volume 42, Issue 9
Displaying 1-10 of 10 articles from this issue
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Makoto NISHIMURA1999 Volume 42 Issue 9 Pages 791-796
Published: September 20, 1999
Released on J-STAGE: October 20, 2009
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Pin on Disk Type Wear TestTerumasa HISAKADO1999 Volume 42 Issue 9 Pages 797-803
Published: September 20, 1999
Released on J-STAGE: October 20, 2009
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Koshi ADACHI, Koji KATO1999 Volume 42 Issue 9 Pages 804-808
Published: September 20, 1999
Released on J-STAGE: October 20, 2009
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Kazunori HAYASHIDA, Hiroaki TAKEBAYASHI1999 Volume 42 Issue 9 Pages 809-815
Published: September 20, 1999
Released on J-STAGE: October 20, 2009
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Takayoshi OZAKI1999 Volume 42 Issue 9 Pages 816-820
Published: September 20, 1999
Released on J-STAGE: October 20, 2009
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Takao KANNO, Yoshio KAWAHARA1999 Volume 42 Issue 9 Pages 821-826
Published: September 20, 1999
Released on J-STAGE: October 20, 2009
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Tatsuo ASAMAKI, Tatsuya YAMAGUCHI, Hiroshi UDAGAWA, Michiro TAKEUCHI, ...1999 Volume 42 Issue 9 Pages 827-833
Published: September 20, 1999
Released on J-STAGE: October 20, 2009
JOURNAL FREE ACCESSWe have developed a new type of magnetron gauge to obtain linear response of the ion current to the pressure in a wider range with a higher sensitivity. The gauge is equipped with two ion collectors while the ratio of the ion currents is measured and kept constant with a feed-back control of the filament heating voltage. The constant ratio, e.g. 0.4 in a range between 3×10-2 and 2×10-9 Pa, resulted from a geometrically similar generation of ions, hence from a spatial electron distribution independent of the pressure. In this report we describe the principle, the design, and results of the new type of magnetron gauge, by comparing them with those of conventional types and of B-A gauges.View full abstractDownload PDF (883K) -
Takayuki SATO, Shinichiro MICHIZONO, Yoshio SAITO, Shinichi KOBAYASHI1999 Volume 42 Issue 9 Pages 834-839
Published: September 20, 1999
Released on J-STAGE: January 30, 2010
JOURNAL FREE ACCESSRf-windows are used at the output portion of the klystrons to isolate vacuum and transmit the rf-power. Surface flashover of alumina ceramics limits the transmission power of microwaves. The surface flashover depends not only on the high secondary electron emission coefficients, but also on electronic states of oxygen vacancies existing adjacent to the ceramic surface. Secondary electron emission (SEE) coefficients and cathodoluminescence (CL) measurements were performed on alumina ceramics after annealing or x-ray irradiation. The experimental results revealed that (1) SEE coefficients increased and the intensity of CL-spectra corresponding to F+-center, which is one of oxygen vacancy states, decreased after annealing, and (2) the intensity of CL-spectra corresponding to F+-center decreased after x-ray irradiation.View full abstractDownload PDF (1113K) -
Seiichiro KANNO, Tatehito USUI1999 Volume 42 Issue 9 Pages 840-844
Published: September 20, 1999
Released on J-STAGE: October 20, 2009
JOURNAL FREE ACCESSThe electrostatic chuck (ESC) is being applied to the wafer stages for various kinds of semiconductor-manufacturing machines. This is because the ESC can control the wafer temperature very precisely if helium backside gas is used at the same time. The basic components of the ESC are an electrode and a dielectric layer. The wafer is attracted to the dielectric layer by the coulomb force generated from the electric charge when DC voltage is applied betwween the electrode and wafer. However, a residual clamping force remains if a charge remains after DC votage release. Preventing this residual clamping force is a key to using the ESC because it degrades wafer throughput. We have examined how this clamping force degrades the performance of a bipolar ESC with electrically independent dual electrodes. The cause of the residual clamping force was studied on the basis of an equilibrium circuit of ESC.View full abstractDownload PDF (621K) -
Yukio INOKUTI, Kazuhiro SUZUKI1999 Volume 42 Issue 9 Pages 845-849
Published: September 20, 1999
Released on J-STAGE: October 20, 2009
JOURNAL FREE ACCESSThe magnetic properties of the TiN-coated silicon steel sheets were evaluated. TiN films were prepared by using three methods such as hollow cathode discharge (HCD), electron beam (EB) evaporation combined with HCD (EB+HCD) and EB combined radio frequency (RF) discharge (EB+RF). X-ray diffraction, color monitoring, Ti/N mass ratio analysis and observations of the scanning electron microscope were also carried out.
The magnetic flux density (B8) and iron loss (W17/50) of the TiN-coated silicon steel sheets were remarkably improved. For comparison of W17/50 improvement for the HCD method, it was about 70% higher for the EB+HCD method and about 50% higher for the EB+RF method.
Scanning electron microscopic observation revealed fine and smooth TiN films for the HCD method, intermediate one for the EB+HCD, and a convex and concave one for the EB+RF.
X-ray diffraction inspection for the HCD method showed a strong peak of (111) of TiN, while that for the EB+HCD showed comparatively strong (111), and that for the EB+RF showed strong (200), (111) and (110) peaks and weak (311) and (222) peaks.View full abstractDownload PDF (1038K)
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