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Reflection Electron Microscopy Observation of the Silicon Wafer Surface

Kouichirou HONDA, Akira OHSAWA

1988 Volume 31 Issue 9 Pages 783-788
Published: September 20, 1988
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.31.783

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Surface roughness of polished silicon wafers was observed by reflection electron microscopy (REM). Small steps were clearly resolved as fringe patteren, and rather rough steps of 1.2-1.6 nm in height and 200-500 nm in interval were observed as dark and bright bands. The Si-SiO₂ interface was also observed by REM. REM has been confirmed as an effective means of observing both the silicon surface and the Si-SiO₂ interface.

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Properties of the B-Si-N Ceramic Thin Films by Plasma-CVD

Takahiro NAKAHIGASHI, Yoshitaka SETOGUCHI, Hiroya KIRIMURA, Kiyoshi OG ...

1988 Volume 31 Issue 9 Pages 789-795
Published: September 20, 1988
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.31.789

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B-Si-N composite thin films were prepared by the plasma enhanced chemical vapour deposition method of inductive couple. The purpose of this paper is a micro structual control of boron nitride film, so we added Si in this film. The source gases used were B₂H₆, SiH₄ and N₂. The rf power, tempareture of substrate and gas pressure during depositions were 20 W, 300°C and 2 × 10^-2 Torr, respectively. The physical, mechanical and optical properties of the films were investigated by several methods to clarify the effect of Si content. The following results were obtained;
1) The prepared B-Si-N thin films were composed of two phases of BN and SiNx.
2) The hardness (Hv) of the thin films gradually decreased from 6, 000 to 3, 000 as Si content increaced from O to 48 at%.
3) The fracture toughness of the thin film improved dramatically when Si content exceeded 10 at%.
4) The transmission and refractive index within a range between 700 and 2, 000 nm in wavelength, were 95-99% and 1.4-1.9 respectively depending on Si content.

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A Modeling of Pore Structure in Isotropic Graphite for Evaluation of Outgassing Phenomena

Kenya AKAISHI

1988 Volume 31 Issue 9 Pages 796-800
Published: September 20, 1988
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.31.796

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A simple modeling on Pore structure in graphite bulk is made by assuming that many number of open-ended capillary tubes are distributed equivalently for three dimensional directions, in order to describe analytically surface roughness factor and gas permeability of a porous isotropic graphite sample. In the model for the pore structure of the graphite, avarage tube diameter, avarage tube length and avarage number density of distributed tubes in unit area are defined. The formulation describing the surface roughness factor and the gas permeability is made with derived geometrical parameters for the capillary tube model, and then these parameters are determined numerically by using experimental data produced by other workers on roughness factors and gas permeabilities for many graphite samples. The validity of the model is discussed for evaluation of outgassing properties of graphite materials.

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Preparation of Amorphous CoFe₂O₄ Films by Dual Source Evaporation Method and Their Texture

Nobuyuki HIRATSUKA, Shinichi KOBAYASHI, Hiroshi IMADA, Mitsuo SUGIMOTO

1988 Volume 31 Issue 9 Pages 801-804
Published: September 20, 1988
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.31.801

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Amorphous cobalt ferrite films were prepared by the dual source evaporation method adopting CoFe₂ alloy and P₂O₅ as the starting materials. The films were made under various levels of pressure of evaporated P₂O₅ (P_P₂O₅) and the maximum perpendicular magnetic anisotropy constant, 8 × 10⁴ J/m³, was obtained at P_P₂O₅= 1.3 Pa. The observation of SEM showed that the films were composed of the oriented texture with a fine columnar structure, which was presumed the cause of the large magnetic anisotropy. The binding energies of Co, Fe, P and 0 of the film were measured by ESCA and it was found that a small amount of nonreactive oxides of Co and Fe were still extant and also the existence of phosphorus oxides with P³⁺ and P⁵⁺. The measurement of broad Mossbauer spectrum could be assumed that the films have a complex magnetic structure.

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Ultra-High Vacuum Property of All Aluminum Alloy Equipment for Sputtering Deposition

Hiroyuki YAMAKAWA

1988 Volume 31 Issue 9 Pages 805-807
Published: September 20, 1988
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.31.805

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An all aluminum alloy equipment has been developed for a sputtering deposition of high quality thin films. The equipment is consist of an aluminum alloy sputter chamber with TiN coating, an aluminum alloy cryopump and an oil-free roughing pump system. It is interesting to investigate a pumping behavior and an ultra-high vacuum property of the equipment. The pressure in the sputter chamber could be lowered to 1.3 × 10^-8 Pa (9.7 × 10^-11 Torr) after a bakeout of 130°C × 46 hours.

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Testing of JSK Hi-precision Joint

Tomio KUBO, Naoya MIYASHITA, Hajime ISHIMARU

1988 Volume 31 Issue 9 Pages 808-810
Published: September 20, 1988
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.31.808

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[title in Japanese]

Koh MATSUMOTO

1988 Volume 31 Issue 9 Pages 812-815
Published: September 20, 1988
Released on J-STAGE: September 29, 2009

DOIhttps://doi.org/10.3131/jvsj.31.812

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