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Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
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Volume 19, Issue 4
Displaying 1-4 of 4 articles from this issue
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  • Thin Film Growth Observed by Auger Electron Spectroscopy (AES) Method-Theoretical Approach-
    Heizo TOKUTAKA, Katumi NISHIMORI, Katumi TAKASHIMA
    1976 Volume 19 Issue 4 Pages 111-115
    Published: April 20, 1976
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.19.111
    JOURNAL FREE ACCESS
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    When deposits condense on a substrate, the growth behaviour of such a case is first numerated by Seah (Surface Sci. 40 (1973) 595). In this growth mode, AES signals from deposits and substrate can be calculated as a function of a film thickness. The difference between a monolayer overgrowth and a condensation (or a statistical growth) mode is compared for the case of Ag deposition on Ni. The method of the calculus is also applied for the case of an island growth mode. The result explains quite well the experiments.
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  • AES Study of Aluminium Diffusion into Silicon Nitride Film
    Kiyoshi KANAYAMA, Makoto OHTANI, Kenzo FUJIWARA, Haruhiko ABE, Mitsuak ...
    1976 Volume 19 Issue 4 Pages 116-121
    Published: April 20, 1976
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.19.116
    JOURNAL FREE ACCESS
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    Auger electron spectroscopy has been applied to the study of the aluminium diffusion into amorphous silicon nitride film (which contains a few atomic percents of impurity oxygen) on silicon dioxide. By heat treatment at 500°C for 30 min, aluminium is found to diffuse into the depth of 300Å, where the concentration becomes below 5 × 1019 atoms/cm3. The activation energy of the diffusion and the diffusion coefficient are 2.0 eV and 7.3 × 10-3 cm2/sec, respectively. The KLL-aluminium Auger spectrum and the in-depth profile of impurities indicate that the migration of aluminium is dominated by the volume diffusion which involves the reaction of aluminium and oxygen.
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  • Determination of Growth Mode of Deposited Film by Auger and Loss Spectroscopy
    Toru KANAJI, Takami KAGOTANI, Saburo NAGATA
    1976 Volume 19 Issue 4 Pages 122-128
    Published: April 20, 1976
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.19.122
    JOURNAL FREE ACCESS
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    Growth mode of the iron films deposited on MgO (001) surfaces with and which contamination was studied on the basis of Palmberg's criterion. The deposition rate of the films was controlled about 1.2 Å min-1 and the residual gas pressure during the deposition was kept lower than 2 × 10-10 Torr. For the application of the criterion to the growth mode analysis, the change of several Auger peak heights of the substrate and the deposit should be measured with the amount of deposition. Some of the Auger peaks, Mg (KLL), Mg (LVV), and Fe (M2, 3M4, 5M4, 5), are, however, not suitable for the purpose because they are disturbed by the experimental difficulties. The energy differences among O (KLL), Fe (L3M2, 3M2, 3), Fe (L3M2, 3V), and Fe (L3VV) peaks are insufficient for the purpose. Therefore, in this study, Fe-L3 shell ionization loss peak was used in addition to the Auger peaks. The films deposited on a contaminated surface seemed to grow through island structure, and those deposited on a carefully cleaned surface seemed to grow through layer by layer fashion.
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  • Inorganic Adhesives
    SUMICERAM
    Koichi YAMADA, Tadanori HASHIMOTO, Yoshinori FURUMI
    1976 Volume 19 Issue 4 Pages 129-135
    Published: April 20, 1976
    Released on J-STAGE: September 29, 2009
    DOIhttps://doi.org/10.3131/jvsj.19.129
    JOURNAL FREE ACCESS
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